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1.发明授权Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method 有权清洁装置，光刻设备和光刻设备清洁方法公开(公告)号：US09013672B2
公开(公告)日：2015-04-21
申请号：US11819949
申请日：2007-06-29
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
CPC分类号： G03F7/70925 , B08B3/12 , G03F7/70341
摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
摘要翻译： 公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用超声波通过液体清洁浸没式光刻投影设备的表面的方法。 在液体中诱导流动，期望地是径向流动。
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公开(公告)号：US07900641B2
公开(公告)日：2011-03-08
申请号：US11819959
申请日：2007-06-29
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： B08B3/04
CPC分类号： G03F7/70925 , B08B3/12 , G03F7/70341
摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
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3.发明申请公开(公告)号：US20080284990A1
公开(公告)日：2008-11-20
申请号：US12081169
申请日：2008-04-11
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341
摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
摘要翻译： 公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用超声波通过液体清洁浸没式光刻投影设备的表面的方法。 在液体中诱导流动，期望地是径向流动。
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公开(公告)号：US20110292359A1
公开(公告)日：2011-12-01
申请号：US13198479
申请日：2011-08-04
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
CPC分类号： B08B3/12 , B08B3/08 , B08B2203/0288 , G03F7/70341 , G03F7/70925
摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
摘要翻译： 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，液体供应装置，其构造成向要清洁的表面和声音换能器之间的储存器提供液体，以及液体出口，该液体出口构造成去除由液体供应装置提供的液体，所构建的清洁工具和 被布置为使得在使用中，液体在重力的影响下流入出口。
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5.发明申请Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method 有权清洁装置，光刻设备和光刻设备清洁方法公开(公告)号：US20080273181A1
公开(公告)日：2008-11-06
申请号：US11819949
申请日：2007-06-29
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , B08B3/12 , G03F7/70341
摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
摘要翻译： 公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用超声波通过液体清洁浸没式光刻投影设备的表面的方法。 在液体中诱导流动，期望地是径向流动。
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公开(公告)号：US08947629B2
公开(公告)日：2015-02-03
申请号：US12081169
申请日：2008-04-11
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341
摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
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公开(公告)号：US20080271747A1
公开(公告)日：2008-11-06
申请号：US11819959
申请日：2007-06-29
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： B08B3/12
CPC分类号： G03F7/70925 , B08B3/12 , G03F7/70341
摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
摘要翻译： 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，液体供应装置，其构造成向要清洁的表面和声音换能器之间的储存器提供液体，以及液体出口，该液体出口构造成去除由液体供应装置提供的液体，所构建的清洁工具和 被布置为使得在使用中，液体在重力的影响下流入出口。
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公开(公告)号：US08011377B2
公开(公告)日：2011-09-06
申请号：US12081170
申请日：2008-04-11
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marlus Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marlus Beeren , Kornelis Tijmen Hoekerd
IPC分类号： B08B3/04
CPC分类号： B08B3/12 , B08B3/08 , B08B2203/0288 , G03F7/70341 , G03F7/70925
摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
摘要翻译： 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，液体供应装置，其构造成向要清洁的表面和声音换能器之间的储存器提供液体，以及液体出口，该液体出口构造成去除由液体供应装置提供的液体，所构建的清洁工具和 被布置为使得在使用中，液体在重力的影响下流入出口。
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公开(公告)号：US07969548B2
公开(公告)日：2011-06-28
申请号：US11437876
申请日：2006-05-22
申请人： Marco Koert Stavenga , Hans Jansen , Peter Franciscus Wanten , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren
发明人： Marco Koert Stavenga , Hans Jansen , Peter Franciscus Wanten , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren
CPC分类号： H01L21/68735 , G03F7/70916 , G03F7/70925
摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.
摘要翻译： 公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用兆声波清洁浸没式光刻投影设备的表面的方法。
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公开(公告)号：US20070285631A1
公开(公告)日：2007-12-13
申请号：US11437876
申请日：2006-05-22
申请人： Marco Koert Stavenga , Hans Jansen , Peter Franciscus Wanten , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren
发明人： Marco Koert Stavenga , Hans Jansen , Peter Franciscus Wanten , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren
CPC分类号： H01L21/68735 , G03F7/70916 , G03F7/70925
摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.
摘要翻译： 公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用兆声波清洁浸没式光刻投影设备的表面的方法。
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