发明申请
- 专利标题: Lateral Junction Field Effect Transistor and Method of Manufacturing The Same
- 专利标题(中): 横向结场效应晶体管及其制造方法
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申请号: US12179320申请日: 2008-07-24
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公开(公告)号: US20080277696A1公开(公告)日: 2008-11-13
- 发明人: Kazuhiro Fujikawa , Shin Harada , Kenichi Hirotsu , Satoshi Hatsukawa , Takashi Hoshino , Hiroyuki Matsunami , Tsunenobu Kimoto
- 申请人: Kazuhiro Fujikawa , Shin Harada , Kenichi Hirotsu , Satoshi Hatsukawa , Takashi Hoshino , Hiroyuki Matsunami , Tsunenobu Kimoto
- 申请人地址: JP Osaka
- 专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JP Osaka
- 优先权: JP2002-071944 20020315
- 主分类号: H01L29/808
- IPC分类号: H01L29/808
摘要:
A lateral junction field effect transistor includes a first gate electrode layer arranged in a third semiconductor layer between source/drain region layers, having a lower surface extending on the second semiconductor layer, and doped with p-type impurities more heavily than the second semiconductor layer, and a second gate electrode layer arranged in a fifth semiconductor layer between the source/drain region layers, having a lower surface extending on a fourth semiconductor layer, having substantially the same concentration of p-type impurities as the first gate electrode layer, and having the same potential as the first gate electrode layer. Thereby, the lateral junction field effect transistor has a structure, which can reduce an on-resistance while maintaining good breakdown voltage properties.
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