发明申请
US20080304734A1 Alignment correction prio to image sampling in inspection systems 审中-公开
校准校正prio到检查系统中的图像采样

Alignment correction prio to image sampling in inspection systems
摘要:
A method and apparatus, and variations of each, for inspecting a wafer defining at least one die thereon is disclosed. The present invention first obtains the electronic image equivalent of two die, and then determines the x and y offset between those electronic images. Prior to inspection for defects, those two electronic images are aligned by adjusting the x and y positions of one electronic image of one die with respect to the electronic image of the other die. Once that is accomplished, the those electronic images are compared to detect any defects that may exist on one of the die.
信息查询
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