Invention Application
- Patent Title: Semiconductor Device and Fabrication Method Thereof
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US12230954Application Date: 2008-09-09
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Publication No.: US20090014724A1Publication Date: 2009-01-15
- Inventor: Shunpei Yamazaki , Satoshi Murakami , Jun Koyama , Yukio Tanaka , Hidehito Kitakado , Hideto Ohnumo
- Applicant: Shunpei Yamazaki , Satoshi Murakami , Jun Koyama , Yukio Tanaka , Hidehito Kitakado , Hideto Ohnumo
- Applicant Address: JP Atsugi-shi
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi
- Priority: JP11-045558 19990223
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
This invention provides a semiconductor device having high operation performance and high reliability. An LDD region 707 overlapping with a gate wiring is arranged in an n-channel TFT 802 forming a driving circuit, and a TFT structure highly resistant to hot carrier injection is achieved. LDD regions 717, 718, 719 and 720 not overlapping with a gate wiring are arranged in an n-channel TFT 804 forming a pixel unit. As a result, a TFT structure having a small OFF current value is achieved. In this instance, an element belonging to the Group 15 of the Periodic Table exists in a higher concentration in the LDD region 707 than in the LDD regions 717, 718, 719 and 720.
Public/Granted literature
- US07745829B2 Semiconductor device and fabrication method thereof Public/Granted day:2010-06-29
Information query
IPC分类: