发明申请
- 专利标题： ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- 专利标题（中）： 照明系统特别适用于微晶
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申请号： US12212926申请日： 2008-09-18
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公开(公告)号： US20090015812A1公开(公告)日： 2009-01-15
- 发明人: Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
- 申请人： Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
- 申请人地址： US DE Oberkochen
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： US DE Oberkochen
- 优先权： DE19819898 19980505; DE19903807 19990202; DE29902108 19990208; EPPCT/EP00/07258 20000728
- 主分类号： G03B27/54
- IPC分类号： G03B27/54
摘要：
There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
公开/授权文献
- US1945822A Method and apparatus for measuring viscosity 公开/授权日：1934-02-06