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公开(公告)号：US20090015812A1
公开(公告)日：2009-01-15
申请号：US12212926
申请日：2008-09-18
申请人： Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G03B27/54
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
摘要翻译： 提供了一种用于沿着扫描方向进行扫描器微光刻的照明系统，其中发射波长<= 193nm的光源。 照明系统包括多个光栅元件。 将多个光栅元件成像为照明系统的图像平面，以产生部分地叠加在图像平面中的场上的多个图像。 该场在扫描方向上定义非矩形强度分布。
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公开(公告)号：US20060245540A1
公开(公告)日：2006-11-02
申请号：US11345880
申请日：2006-02-02
申请人： Jorg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Jorg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G21K5/00
CPC分类号： G02B3/0043 , B82Y10/00 , G02B3/0062 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
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公开(公告)号：US07443948B2
公开(公告)日：2008-10-28
申请号：US11345880
申请日：2006-02-02
申请人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G21K5/04
CPC分类号： G02B3/0043 , B82Y10/00 , G02B3/0062 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.
摘要翻译： 提供照明系统。 所述照明系统包括（a）具有小于或等于193nm的波长的光源，以及（b）光的路径中的光学元件，具有第一光栅元件，第二光栅元件，第三光栅元件 栅格元素和位于其上的第四光栅元素。 第二光栅元素与第一光栅元素相邻，并且与第一光栅元素位于第一距离。 第四光栅元素与第三光栅元素相邻，并且与第三光栅元素相距第二距离。 第二距离与第一距离不同。
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公开(公告)号：US07006595B2
公开(公告)日：2006-02-28
申请号：US10150650
申请日：2002-05-17
申请人： Wolfgang Singer , Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Wolfgang Singer , Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
CPC分类号： G02B3/0043 , B82Y10/00 , G02B3/0062 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
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公开(公告)号：US07977651B2
公开(公告)日：2011-07-12
申请号：US12547135
申请日：2009-08-25
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译： 提供了一种用于投影曝光装置的投影物镜，该投影曝光装置具有用于发射具有波长＆nlE; 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。
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公开(公告)号：US20080130076A1
公开(公告)日：2008-06-05
申请号：US12009984
申请日：2008-01-23
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.
摘要翻译： 提供了一种用于微光刻的照明系统。 该照明系统包括具有多个场光栅元件的光学元件，其中照射场的平面以及位于从光学元件到平面的光路中的掠入射镜之后的光学元件。 照明系统在光路中，光学元件之后和平面之前没有其他掠入射镜。
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公开(公告)号：US07186983B2
公开(公告)日：2007-03-06
申请号：US10919583
申请日：2004-08-17
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
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公开(公告)号：US07592598B2
公开(公告)日：2009-09-22
申请号：US12257910
申请日：2008-10-24
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。
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公开(公告)号：US20070120072A1
公开(公告)日：2007-05-31
申请号：US11649199
申请日：2007-01-03
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。
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公开(公告)号：US20090316128A1
公开(公告)日：2009-12-24
申请号：US12547135
申请日：2009-08-25
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
IPC分类号： G03B27/70
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。
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