发明申请
- 专利标题: PROCESS FOR PRODUCING ELECTRODE-FORMED GLASS SUBSTRATE
- 专利标题(中): 用于生产电极形成的玻璃基材的方法
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申请号: US12138062申请日: 2008-06-12
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公开(公告)号: US20090017196A1公开(公告)日: 2009-01-15
- 发明人: Satoshi FUJIMINE , Hitoshi Onoda , Kenji Imakita , Yasuko Osaki , Hiroyuki Yamamoto
- 申请人: Satoshi FUJIMINE , Hitoshi Onoda , Kenji Imakita , Yasuko Osaki , Hiroyuki Yamamoto
- 申请人地址: JP Chiyoda-ku
- 专利权人: ASAHI GLASS COMPANY, LIMITED
- 当前专利权人: ASAHI GLASS COMPANY, LIMITED
- 当前专利权人地址: JP Chiyoda-ku
- 优先权: JP2007-184781 20070713; JP2008-127195 20080514
- 主分类号: C03C17/02
- IPC分类号: C03C17/02 ; C03C3/066
摘要:
To provide a process for producing an electrode-formed glass substrate, which increases the strength of a front substrate of a plasma display device.Electrodes formed on a glass substrate are covered with a lead-free glass comprising, as represented by mass %, from 30 to 50% of B2O3, from 21 to 25% of SiO2, from 10 to 35% of ZnO, from 7 to 14% in total of K2O and either one or both of Li2O and Na2O, from 0 to 10% of Al2O3, from 0 to 10% of ZrO2, and from 0 to 5% of MgO+CaO+SrO+BaO, and when the molar fractions of Li2O, Na2O and K2O are represented by l, n and k, respectively, l is at most 0.025, and l+n+k is from 0.07 to 0.13.
公开/授权文献
- US08183168B2 Process for producing electrode-formed glass substrate 公开/授权日:2012-05-22
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