发明申请
US20090017196A1 PROCESS FOR PRODUCING ELECTRODE-FORMED GLASS SUBSTRATE 有权
用于生产电极形成的玻璃基材的方法

PROCESS FOR PRODUCING ELECTRODE-FORMED GLASS SUBSTRATE
摘要:
To provide a process for producing an electrode-formed glass substrate, which increases the strength of a front substrate of a plasma display device.Electrodes formed on a glass substrate are covered with a lead-free glass comprising, as represented by mass %, from 30 to 50% of B2O3, from 21 to 25% of SiO2, from 10 to 35% of ZnO, from 7 to 14% in total of K2O and either one or both of Li2O and Na2O, from 0 to 10% of Al2O3, from 0 to 10% of ZrO2, and from 0 to 5% of MgO+CaO+SrO+BaO, and when the molar fractions of Li2O, Na2O and K2O are represented by l, n and k, respectively, l is at most 0.025, and l+n+k is from 0.07 to 0.13.
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