Invention Application
US20090018032A1 METHOD OF TREATING SURFACE OF SUBSTRATE USED IN BIOLOGICAL REACTION SYSTEM
审中-公开
处理生物反应体系中使用的底物表面的方法
- Patent Title: METHOD OF TREATING SURFACE OF SUBSTRATE USED IN BIOLOGICAL REACTION SYSTEM
- Patent Title (中): 处理生物反应体系中使用的底物表面的方法
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Application No.: US12238165Application Date: 2008-09-25
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Publication No.: US20090018032A1Publication Date: 2009-01-15
- Inventor: Sun-hee Kim , Soo-suk Lee , Geun-bae Lim , Young-sun Lee
- Applicant: Sun-hee Kim , Soo-suk Lee , Geun-bae Lim , Young-sun Lee
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2003-5486 20030128
- Main IPC: C40B40/06
- IPC: C40B40/06
Abstract:
Provided is a method of treating a surface of a substrate used in a biochemical reaction system, the method including forming a polymer film on the surface by vapor deposition of a compound of formula (1) below and a compound of formula (2) below: (RO)3—Si—(CH2)n1—X (1) (RO)3—Si—(CH2)n2—(CF2)m—X (2) wherein R is one of a methyl group and an ethyl group, X is one of a methyl group and a trifluoromethyl group, n1 is an integer from 1 to 3, n2 is an integer from 1 to 10, and m is an integer from 1 to 10.
Information query
