发明申请
- 专利标题： EUV Reticle Handling System and Method
- 专利标题（中）： EUV光栅处理系统和方法
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申请号： US12242050申请日： 2008-09-30
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公开(公告)号： US20090027639A1公开(公告)日： 2009-01-29
- 发明人: Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
- 申请人： Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.
公开/授权文献
- US07804583B2 EUV reticle handling system and method 公开/授权日：2010-09-28
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