发明申请
US20090066970A1 Arrangement and method for improving the measurement accuracy in the nm range for optical systems
审中-公开
用于提高光学系统的nm范围内的测量精度的布置和方法
- 专利标题： Arrangement and method for improving the measurement accuracy in the nm range for optical systems
- 专利标题（中）： 用于提高光学系统的nm范围内的测量精度的布置和方法
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申请号： US12154051申请日： 2008-05-20
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公开(公告)号： US20090066970A1公开(公告)日： 2009-03-12
- 发明人: Gerd Scheuring , Hans-Artur Boesser , Wolfgang Sulik , Michael Heiden , Walter Steinberg
- 申请人： Gerd Scheuring , Hans-Artur Boesser , Wolfgang Sulik , Michael Heiden , Walter Steinberg
- 申请人地址： DE Muenchen DE Weilburg
- 专利权人： MueTec Automatisierte Mikroskopie und Messtechnik GmbH,VISTEC Semiconductor Systems GmbH
- 当前专利权人： MueTec Automatisierte Mikroskopie und Messtechnik GmbH,VISTEC Semiconductor Systems GmbH
- 当前专利权人地址： DE Muenchen DE Weilburg
- 优先权： DEDE102007023796.2 20070521
- 主分类号： G01B11/02
- IPC分类号： G01B11/02
摘要：
A method and a device for improving the measurement accuracy in the nm range for optical systems are disclosed. The object is provided with a plurality of structures oriented in the X and Y-coordinate direction. The light beam coming from at least one light source defines an optical illumination path.
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