发明申请
- 专利标题: ACCURATE MEASUREMENT OF LAYER DIMENSIONS USING XRF
- 专利标题(中): 使用XRF精确测量层数
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申请号: US12272050申请日: 2008-11-17
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公开(公告)号: US20090074137A1公开(公告)日: 2009-03-19
- 发明人: Dileep Agnihotri , Jeremy O'Dell , Isaac Mazor , Boris Yokhin
- 申请人: Dileep Agnihotri , Jeremy O'Dell , Isaac Mazor , Boris Yokhin
- 申请人地址: IL Migdal Haemek
- 专利权人: JORDAN VALLEY SEMICONDUCTORS LTD.
- 当前专利权人: JORDAN VALLEY SEMICONDUCTORS LTD.
- 当前专利权人地址: IL Migdal Haemek
- 主分类号: G01N23/223
- IPC分类号: G01N23/223
摘要:
A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.
公开/授权文献
- US07804934B2 Accurate measurement of layer dimensions using XRF 公开/授权日:2010-09-28
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