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    Measurement of properties of thin films on sidewalls
    3.
    发明授权
    Measurement of properties of thin films on sidewalls 有权
    测量侧壁薄膜的性能

    公开(公告)号：US07483513B2

    公开(公告)日：2009-01-27

    申请号：US11487433

    申请日：2006-07-17

    Applicant: Isaac Mazor ,  Boris Yokhin

    Inventor： Isaac Mazor ,  Boris Yokhin

    IPC: G01N23/20

    CPC classification number: G01N23/20

    Abstract: A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.

    Abstract translation: 用于样品的X射线分析的方法包括引导X射线束照射到样品表面上的周期性特征的区域上，并以反射模式接收从表面散射的X射线，以便 检测散射X射线中的衍射光谱作为方位角的函数。 分析衍射光谱以确定特征的尺寸。

    Measurement of critical dimensions using X-ray diffraction in reflection mode
    4.
    发明授权
    Measurement of critical dimensions using X-ray diffraction in reflection mode 有权
    在反射模式下使用X射线衍射测量临界尺寸

    公开(公告)号：US07110491B2

    公开(公告)日：2006-09-19

    申请号：US11018352

    申请日：2004-12-22

    Applicant: Isaac Mazor ,  Boris Yokhin

    Inventor： Isaac Mazor ,  Boris Yokhin

    IPC: G01N23/20

    CPC classification number: G01N23/20

    Abstract: A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.

    Abstract translation: 用于样品的X射线分析的方法包括引导X射线束照射到样品表面上的周期性特征的区域上，并以反射模式接收从表面散射的X射线，以便 检测散射X射线中的衍射光谱作为方位角的函数。 分析衍射光谱以确定特征的尺寸。

    Optical alignment of X-ray microanalyzers
    6.
    发明申请
    Optical alignment of X-ray microanalyzers 有权
    X射线微量分析仪的光学校准

    公开(公告)号：US20050069090A1

    公开(公告)日：2005-03-31

    申请号：US10673996

    申请日：2003-09-29

    Applicant: Tzachi Rafaeli ,  Isaac Mazor

    Inventor： Tzachi Rafaeli ,  Isaac Mazor

    IPC: G01N23/223 ,  A61B6/08 ,  G01N23/22

    CPC classification number: G01N23/22

    Abstract: A method for X-ray analysis of a sample includes aligning an optical radiation source with an X-ray excitation source, so that a spot on the sample that is irradiated by an X-ray beam generated by the X-ray excitation source is illuminated with optical radiation generated by the optical radiation source. Optical radiation that is reflected from the sample is used to generate a first signal, which is indicative of an alignment of the spot on the sample. The X-ray beam is aligned, responsively to the first signal, so that the spot coincides with a target area of the sample. X-ray photons received from the spot on the sample, after aligning the X-ray beam, are used in generating a second signal that is indicative of a characteristic of the target area.

    Abstract translation: 用于样品的X射线分析的方法包括使光辐射源与X射线激发源对准，使得由X射线激发源产生的X射线束照射的样品上的斑点被照亮 具有由光辐射源产生的光辐射。 从样品反射的光辐射用于产生第一信号，其表示样品上的斑点的对准。 响应于第一信号将X射线束对准，使得斑点与样品的目标区域重合。 在对准X射线束之后从样品上的点接收的X射线光子用于产生指示目标区域的特征的第二信号。

    X-ray reflectometer
    7.
    发明授权
    X-ray reflectometer 有权

    公开(公告)号：US06512814B2

    公开(公告)日：2003-01-28

    申请号：US09833902

    申请日：2001-04-12

    Applicant: Boris Yokhin ,  Alexander Dikopoltsev ,  Isaac Mazor ,  David Berman

    Inventor： Boris Yokhin ,  Alexander Dikopoltsev ,  Isaac Mazor ,  David Berman

    IPC: G01T136

    CPC classification number: G01T1/36

    Abstract: Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.

    X-ray microanalyzer for thin films
    8.
    发明授权
    X-ray microanalyzer for thin films 有权
    用于薄膜的X射线微量分析仪

    公开(公告)号：US06381303B1

    公开(公告)日：2002-04-30

    申请号：US09408894

    申请日：1999-09-29

    Applicant: Long Vu ,  Boris Yokhin ,  Isaac Mazor ,  Amos Gvirtzman

    Inventor： Long Vu ,  Boris Yokhin ,  Isaac Mazor ,  Amos Gvirtzman

    IPC: G01N23223

    CPC classification number: G01N23/20

    Abstract: Apparatus for X-ray microanalysis of a sample includes an X-ray source, which irradiates a spot having a dimension less than 500 &mgr;m on a surface of the sample. A first X-ray detector captures fluorescent X-rays emitted from the sample, responsive to the irradiation, at a high angle relative to the surface of the sample. A second X-ray detector captures X-rays from the spot at a grazing angle relative to the surface of the sample. Processing circuitry receives respective signals from the first and second X-ray detectors responsive to the X-rays captured thereby, and analyzes the signals in combination to determine a property of a surface layer of the sample within the area of the spot.

    Abstract translation: 用于样品的X射线微量分析的装置包括X射线源，其在样品的表面上照射尺寸小于500μm的斑点。 第一X射线检测器相对于样品的表面以高角度捕获从样品发射的荧光X射线，其响应于照射。 第二个X射线检测器以相对于样品表面的掠角捕获来自斑点的X射线。 处理电路响应于由此捕获的X射线，从第一和第二X射线检测器接收相应的信号，并组合分析信号以确定样品在斑点区域内的表面层的性质。

    Detection of voids in semiconductor wafer processing
    9.
    发明授权
    Detection of voids in semiconductor wafer processing 有权
    检测半导体晶片加工中的空隙

    公开(公告)号：US06351516B1

    公开(公告)日：2002-02-26

    申请号：US09461670

    申请日：1999-12-14

    Applicant: Isaac Mazor ,  Long Vu

    Inventor： Isaac Mazor ,  Long Vu

    IPC: G01N23223

    CPC classification number: H01L21/76877 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/648 ,  H01L22/12

    Abstract: A method for testing the deposition and/or the removal of a material within a recess on the surface of a sample. An excitation beam is directed onto a region of the sample in a vicinity of the recess, and an intensity of X-ray fluorescence, emitted from the region in a spectral range in which the material is known to fluoresce, is measured. A quantity of the material that is deposited within the recess is determined responsive to the measured intensity.

    Abstract translation: 一种用于测试在样品表面上的凹槽内的材料的沉积和/或去除的方法。 激发光束被引导到在凹部附近的样品的区域上，并且测量从该材料已知发荧光的光谱范围内的区域发射的X射线荧光强度。 根据测量的强度确定沉积在凹部内的一定量的材料。

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