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    ACCURATE MEASUREMENT OF LAYER DIMENSIONS USING XRF
    1.
    发明申请
    ACCURATE MEASUREMENT OF LAYER DIMENSIONS USING XRF 有权
    使用XRF精确测量层数

    公开(公告)号：US20090074137A1

    公开(公告)日：2009-03-19

    申请号：US12272050

    申请日：2008-11-17

    申请人： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

    发明人： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

    IPC分类号： G01N23/223

    CPC分类号： G01B15/02 ,  G01N23/223 ,  G01N2223/076 ,  H01L22/12

    摘要： A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.

    摘要翻译： 用于检查样品的方法包括引导激发光束撞击平面样品的区域，该平面样品的区域包括具有垂直于样品平面的侧壁的特征，该侧壁在其上具有薄膜。 测量响应于激发光束从样品发射的X射线荧光强度（XRF），并且基于强度来评估侧壁上的薄膜的厚度。 在另一种方法中，使用XRF来评估样品的表面层中的凹陷的宽度和抛光后沉积在凹部中的材料的厚度。

    Accurate measurement of layer dimensions using XRF
    2.
    发明授权
    Accurate measurement of layer dimensions using XRF 有权
    使用XRF精确测量层的尺寸

    公开(公告)号：US07804934B2

    公开(公告)日：2010-09-28

    申请号：US12272050

    申请日：2008-11-17

    申请人： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

    发明人： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

    IPC分类号： G01N23/223 ,  G01T1/36

    CPC分类号： G01B15/02 ,  G01N23/223 ,  G01N2223/076 ,  H01L22/12

    摘要： A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.

    摘要翻译： 用于检查样品的方法包括引导激发光束撞击平面样品的区域，该平面样品的区域包括具有垂直于样品平面的侧壁的特征，该侧壁在其上具有薄膜。 测量响应于激发光束从样品发射的X射线荧光强度（XRF），并且基于强度来评估侧壁上的薄膜的厚度。 在另一种方法中，使用XRF来评估样品的表面层中的凹陷的宽度和抛光后沉积在凹部中的材料的厚度。

    Automated selection of X-ray reflectometry measurement locations
    3.
    发明授权
    Automated selection of X-ray reflectometry measurement locations 有权
    自动选择X射线反射测量位置

    公开(公告)号：US07649978B2

    公开(公告)日：2010-01-19

    申请号：US12232259

    申请日：2008-09-12

    申请人： Isaac Mazor ,  Alex Dikopoltsev ,  Boris Yokhin ,  Dileep Agnihotri ,  Tzachi Rafaeli ,  Alex Tokar ,  David Berman ,  Moshe Beylin

    发明人： Isaac Mazor ,  Alex Dikopoltsev ,  Boris Yokhin ,  Dileep Agnihotri ,  Tzachi Rafaeli ,  Alex Tokar ,  David Berman ,  Moshe Beylin

    IPC分类号： G01B15/02

    CPC分类号： G01N23/201 ,  G01N2223/052

    摘要： The computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective location. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected location.

    摘要翻译： 用于检查样品的计算机实现的方法包括在样品的表面上限定多个位置，用X射线照射每个位置处的表面，并测量X射线的角度分布， 响应于光束从表面发射，以产生相应的多个X射线光谱。 分析X射线光谱以产生各自的相应的品质因数，表明在相应位置处的X射线光谱的测量质量。 响应于品质因数从多个位置中选择一个或多个位置，并且使用在所选择的位置处测量的X射线光谱来估计样品的性质。

    Automated selection of x-ray reflectometry measurement locations
    4.
    发明申请
    Automated selection of x-ray reflectometry measurement locations 有权
    自动选择x射线反射测量位置

    公开(公告)号：US20090074141A1

    公开(公告)日：2009-03-19

    申请号：US12232259

    申请日：2008-09-12

    申请人： Isaac Mazor ,  Alex Dikopoltsev ,  Boris Yokhin ,  Dileep Agnihotri ,  Tzachi Rafaeli ,  Alex Tokar ,  David Berman ,  Moshe Beylin

    发明人： Isaac Mazor ,  Alex Dikopoltsev ,  Boris Yokhin ,  Dileep Agnihotri ,  Tzachi Rafaeli ,  Alex Tokar ,  David Berman ,  Moshe Beylin

    IPC分类号： G01N23/201 ,  H01L21/02 ,  B05C11/00

    CPC分类号： G01N23/201 ,  G01N2223/052

    摘要： A computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective locations. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected locations.

    摘要翻译： 用于检查样品的计算机实现的方法包括在样品的表面上限定多个位置，用X射线照射每个位置处的表面，并测量X射线的角度分布， 响应于光束从表面发射，以产生相应的多个X射线光谱。 分析X射线光谱以产生各自的相应的品质指数，表示在各个位置处的X射线光谱的测量质量。 响应于品质因数从多个位置中选择一个或多个位置，并且使用在所选择的位置处测量的X射线光谱来估计样品的性质。

    Material analysis using multiple X-ray reflectometry models
    8.
    发明授权
    Material analysis using multiple X-ray reflectometry models 有权
    使用多个X射线反射测量模型的材料分析

    公开(公告)号：US07103142B1

    公开(公告)日：2006-09-05

    申请号：US11065737

    申请日：2005-02-24

    申请人： Dileep Agnihotri ,  Alex Dikopoltsev ,  Boris Yokhin

    发明人： Dileep Agnihotri ,  Alex Dikopoltsev ,  Boris Yokhin

    IPC分类号： G01T1/36

    CPC分类号： G01N23/20

    摘要： A method for inspection of a sample includes irradiating the sample with a beam of X-rays, measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum, and applying a multi-step analysis to the spectrum so as to determine one or more physical properties of a simulated model of the sample. The multi-step analysis includes spectrally analyzing the spectrum so as to determine one or more characteristic frequencies and fitting the simulated model to the spectrum by an iterative optimization process beginning from an initial condition determined by the one or more characteristic frequencies.

    摘要翻译： 用于检查样品的方法包括用X射线照射样品，测量响应于光束从样品发射的X射线的分布，从而产生X射线谱，并且应用多 对光谱进行分析，以确定样品的模拟模型的一个或多个物理性质。 多步分析包括频谱分析频谱，以便通过从由一个或多个特征频率确定的初始条件开始的迭代优化过程来确定一个或多个特征频率并将模拟模型拟合到频谱中。

    MATERIAL ANALYSIS USING MULTIPLE X-RAY REFLECTOMETRY MODELS
    9.
    发明申请
    MATERIAL ANALYSIS USING MULTIPLE X-RAY REFLECTOMETRY MODELS 有权
    使用多个X射线反射光谱模型的材料分析

    公开(公告)号：US20060188062A1

    公开(公告)日：2006-08-24

    申请号：US11065737

    申请日：2005-02-24

    申请人： Dileep Agnihotri ,  Alex Dikopoltsev ,  Boris Yokhin

    发明人： Dileep Agnihotri ,  Alex Dikopoltsev ,  Boris Yokhin

    IPC分类号： G01T1/36 ,  G01N23/20

    CPC分类号： G01N23/20

    摘要： A method for inspection of a sample includes irradiating the sample with a beam of X-rays, measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum, and applying a multi-step analysis to the spectrum so as to determine one or more physical properties of a simulated model of the sample. The multi-step analysis includes spectrally analyzing the spectrum so as to determine one or more characteristic frequencies and fitting the simulated model to the spectrum by an iterative optimization process beginning from an initial condition determined by the one or more characteristic frequencies.

    摘要翻译： 用于检查样品的方法包括用X射线照射样品，测量响应于光束从样品发射的X射线的分布，从而产生X射线谱，并且应用多 对光谱进行分析，以确定样品的模拟模型的一个或多个物理性质。 多步分析包括频谱分析频谱，以便通过从由一个或多个特征频率确定的初始条件开始的迭代优化过程来确定一个或多个特征频率并将模拟模型拟合到频谱中。