发明申请
- 专利标题： FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME
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申请号： US11859804申请日： 2007-09-24
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公开(公告)号： US20090081598A1公开(公告)日： 2009-03-26
- 发明人: Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
- 申请人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： G03C1/73
- IPC分类号： G03C1/73 ; G03C5/00
摘要：
Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
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