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公开(公告)号：US08937448B2
公开(公告)日：2015-01-20
申请号：US13300900
申请日：2011-11-21
CPC分类号： E21B43/128 , H02P23/26 , Y02P80/112
摘要： Systems and methods for processing power provided to downhole electrical systems such as electric submersible pump motors to increase the power factor of the supplied power. In one embodiment, a system comprises a downhole motor and a power factor corrector. The motor may be coupled to drive an electric submersible pump. The power factor corrector is configured to receive input power, process the received input power using one or more capacitive electrical components and thereby impart a capacitive phase shift between the voltage and the current of the received input power. The processed output power is provided to the downhole motor, which consumes the processed output power with a power factor which is greater than it would have been in the absence of the correction.
摘要翻译： 用于处理提供给井下电气系统的电力的系统和方法，例如电潜泵泵马达，以增加供电功率的因数。 在一个实施例中，系统包括井下电动机和功率因数校正器。 马达可以联接以驱动电潜泵。 功率因数校正器被配置为接收输入功率，使用一个或多个电容性电气部件处理所接收的输入功率，从而在所接收的输入功率的电压和电流之间施加电容相移。 处理的输出功率被提供给井下电动机，其以比在没有校正的情况下更大的功率因数来消耗处理的输出功率。
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公开(公告)号：US08137874B2
公开(公告)日：2012-03-20
申请号：US12018541
申请日：2008-01-23
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译： 提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。 抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。
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公开(公告)号：US20110111345A1
公开(公告)日：2011-05-12
申请号：US12613804
申请日：2009-11-06
申请人： Robert D. Allen , Phillip J. Brock , Kuang-Jung Chen , Alexander Friz , Wu-Song Huang , Ratnam Sooriyakumaran , Sally A. Swanson , Hoa D. Truong
发明人： Robert D. Allen , Phillip J. Brock , Kuang-Jung Chen , Alexander Friz , Wu-Song Huang , Ratnam Sooriyakumaran , Sally A. Swanson , Hoa D. Truong
CPC分类号： C09D143/04 , G03F7/0392 , G03F7/0397 , G03F7/0758 , G03F7/094 , G03F7/11 , G03F7/2041 , G03F7/40
摘要： Coating compositions include a polymer including: wherein R1 is a silicon containing moiety, R2 is an acid stable lactone functionality, and R3 is an acid labile lactone functionality; X1, X2, X3 are independently H or CH3; and m and o are non-zero positive integers and n is zero or a positive integer representing the number of repeat units; a photoacid generator; and a solvent. Also disclosed are methods for forming a pattern in the coating composition containing the same.
摘要翻译： 涂料组合物包括聚合物，其包括：其中R1是含硅部分，R2是酸稳定的内酯官能团，R3是酸不稳定的内酯官能团; X 1，X 2，X 3独立地为H或CH 3; 并且m和o是非零正整数，n是零或表示重复单元数的正整数; 光致酸发生器; 和溶剂。 还公开了在含有该图案的涂料组合物中形成图案的方法。
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公开(公告)号：US20110079579A1
公开(公告)日：2011-04-07
申请号：US12574171
申请日：2009-10-06
CPC分类号： G03F7/0752 , C09D7/63 , G03F7/094
摘要： Molecular glass based planarizing compositions for lithographic processing are disclosed. The processes generally include casting the planarizing composition onto a surface comprised of lithographic features, the planarizing composition comprising at least one molecular glass and at least one solvent; and heating the planarizing composition to a temperature greater than a glass transition temperature of the at least one molecular glass. Exemplary molecular glasses include polyhedral oligomeric silsesquioxane derivatives, calixarenes, cyclodextrin derivatives, and other non-polymeric large molecules.
摘要翻译： 公开了用于光刻处理的基于分子玻璃的平面化组合物。 所述方法通常包括将平坦化组合物浇铸到由光刻特征组成的表面上，平坦化组合物包含至少一种分子玻璃和至少一种溶剂; 并且将所述平坦化组合物加热至大于所述至少一种分子玻璃的玻璃化转变温度的温度。 示例性分子玻璃包括多面体低聚倍半硅氧烷衍生物，杯芳烃，环糊精衍生物和其它非聚合大分子。
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5.发明申请Method of Forming a Relief Pattern by E-Beam Lithography Using Chemical Amplification, and Derived Articles 失效通过使用化学扩增的电子束光刻技术形成浮雕图案的方法和衍生文章公开(公告)号：US20110045387A1
公开(公告)日：2011-02-24
申请号：US12542821
申请日：2009-08-18
申请人： Robert D. Allen , Luisa Bozano , Phillip Brock , Qinghuang Lin , Alshakim Nelson , Ratnam Sooriyakumaran
发明人： Robert D. Allen , Luisa Bozano , Phillip Brock , Qinghuang Lin , Alshakim Nelson , Ratnam Sooriyakumaran
CPC分类号： G03F7/038 , G03F7/0757 , G03F7/2059 , G03F7/40
摘要： A method of generating a relief pattern comprises disposing a resist composition on a substrate to form a film, the resist composition comprising a first silsesquioxane polymer of the formula (1): a second silsesquioxane polymer of the formula (2): and a photosensitive acid generator; patternwise exposing the film by e-beam lithography; heating the exposed film to effect crosslinking of the first polymer and second polymer in the exposed area; and developing the exposed film to form a negative relief pattern.
摘要翻译： 产生浮雕图案的方法包括将抗蚀剂组合物设置在基底上以形成膜，抗蚀剂组合物包含式（1）的第一倍半硅氧烷聚合物：式（2）的第二倍半硅氧烷聚合物：和光敏酸 发电机; 通过电子束光刻对图案进行图案曝光; 加热暴露的膜以在暴露的区域中实现第一聚合物和第二聚合物的交联; 并将曝光的胶片显影形成负浮雕图案。
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6.发明授权Functionalized carbosilane polymers and photoresist compositions containing the same 有权官能化碳硅烷聚合物和含有它们的光致抗蚀剂组合物公开(公告)号：US07883828B2
公开(公告)日：2011-02-08
申请号：US12057478
申请日：2008-03-28
申请人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
发明人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
CPC分类号： G03F7/0757 , C08G77/60 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/108 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
摘要翻译： 提供了在193nm处具有小于3.0μm-1的吸光度和相对高的折射率的线性或分支官能化的聚碳硅烷。 官能化聚碳硅烷含有至少一个酸不稳定或水溶性碱可溶的侧基。 还公开了含有适用于光刻（例如浸渍光刻）的官能化聚碳硅烷的光致抗蚀剂制剂。
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公开(公告)号：US07749422B2
公开(公告)日：2010-07-06
申请号：US11694117
申请日：2007-03-30
申请人： Robert D. Allen , Mark W. Hart , Frances Houle , Hiroshi Ito
发明人： Robert D. Allen , Mark W. Hart , Frances Houle , Hiroshi Ito
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition; curing the UV curable composition to form an imprinted composition, wherein the release composition having a basic reactive moiety is effective to locally inhibit curing of the composition at an interface between the template and the imprinted composition; and releasing the template from the imprinted composition.
摘要翻译： 一种压印方法，包括用具有碱性反应性部分的释放组合物涂布微图案化模板的选定表面; 其中所述模板对UV辐射是透明的; 将模板印刷在光固化组合物上; 固化可UV固化组合物以形成印迹组合物，其中具有碱性反应性部分的释放组合物有效地局部抑制组合物在模板和印迹组合物之间的界面处的固化; 并从印迹组合物释放模板。
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公开(公告)号：US20100168337A1
公开(公告)日：2010-07-01
申请号：US12687380
申请日：2010-01-14
IPC分类号： C08L27/12
CPC分类号： G03F7/2041 , G03F7/11 , Y10S438/952
摘要： A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
摘要翻译： 用于浸渍光刻的面漆材料和使用面漆材料进行浸渍光刻的方法。 面漆材料包括第一聚合物和第二聚合物的混合物。 面涂层材料的第一和第二聚合物当面涂层材料形成浸渍流体和光致抗蚀剂层之间的顶涂层时，不均匀地分散在整个顶涂层中。
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9.发明申请公开(公告)号：US20090186294A1
公开(公告)日：2009-07-23
申请号：US12018541
申请日：2008-01-23
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译： 提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。 抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。
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公开(公告)号：US20090081585A1
公开(公告)日：2009-03-26
申请号：US12057478
申请日：2008-03-28
申请人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
发明人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
CPC分类号： G03F7/0757 , C08G77/60 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/108 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
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