发明申请
- 专利标题： MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION
- 专利标题（中）： 用于生产超极紫外线辐射的模块和方法
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申请号： US12197693申请日： 2008-08-25
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公开(公告)号： US20090090877A1公开(公告)日： 2009-04-09
- 发明人: Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriel Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
- 申请人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriel Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G01J3/10
- IPC分类号： G01J3/10 ; G03B27/54
摘要：
A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.
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