发明申请
- 专利标题: METHOD FOR MANUFACTURING POLISHING PAD
- 专利标题(中): 制造抛光垫的方法
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申请号: US12297862申请日: 2007-04-19
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公开(公告)号: US20090093202A1公开(公告)日: 2009-04-09
- 发明人: Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
- 申请人: Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
- 申请人地址: JP Osaka
- 专利权人: Toyo Tire & Rubber Co., Ltd.
- 当前专利权人: Toyo Tire & Rubber Co., Ltd.
- 当前专利权人地址: JP Osaka
- 优先权: JP2006-115890 20060419; JP2006-115897 20060419; JP2006-115904 20060419; JP2006-115907 20060419; JP2007-088388 20070329
- 国际申请: PCT/JP2007/058493 WO 20070419
- 主分类号: B24D11/00
- IPC分类号: B24D11/00
摘要:
A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.