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公开(公告)号：US08348724B2
公开(公告)日：2013-01-08
申请号：US12600201
申请日：2008-05-09
申请人： Masato Doura , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Akinori Sato
发明人： Masato Doura , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Akinori Sato
IPC分类号： B24B1/00
CPC分类号： B24B37/205
摘要： A method for manufacturing a polishing pad prevents slurry leaks and provides a pad that can be used to provide high optical detection accuracy. The method for manufacturing a polishing pad includes forming a groove for injecting a light-transmitting region forming material on the back surface of a polishing layer; injecting the light-transmitting region forming material into the groove and curing the material to form a light-transmitting region; and buffing the front surface of the polishing layer to expose the light-transmitting region on the front surface.
摘要翻译： 抛光垫的制造方法防止浆料泄漏并提供可用于提供高光学检测精度的垫。 抛光垫的制造方法包括在抛光层的背面上形成用于注入透光性区域形成材料的槽， 将所述透光区域形成材料注入所述凹槽中并固化所述材料以形成透光区域; 并抛光抛光层的前表面以暴露前表面上的透光区域。
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公开(公告)号：US08314029B2
公开(公告)日：2012-11-20
申请号：US12593174
申请日：2008-02-29
申请人： Junji Hirose , Takeshi Fukuda , Masato Doura , Akinori Sato , Kenji Nakamura
发明人： Junji Hirose , Takeshi Fukuda , Masato Doura , Akinori Sato , Kenji Nakamura
IPC分类号： H01L21/302
CPC分类号： B24B37/24 , B24D3/32 , B24D18/00 , C08J9/30 , C08J2375/04
摘要： A method for manufacturing a polishing pad containing substantially spherical cells and having high thickness accuracy includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition from a single discharge port to a substantially central portion in the width direction of a face material A, while feeding the face material A; laminating a face material B on the cell-dispersed urethane composition; then uniformly adjusting the thickness of the cell-dispersed urethane composition by thickness adjusting means; curing the cell-dispersed urethane composition with the thickness adjusted in the preceding step without applying any additional load to the composition so that a polishing sheet including a polyurethane foam is formed; and cutting the polishing sheet.
摘要翻译： 一种用于制造包含基本上球形的电池并且具有高厚度精度的抛光垫的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在单面排出口向面材A的宽度方向的大致中央部连续排出细胞分散型尿烷组合物，同时供给面材A; 将面料B层压在细胞分散的聚氨酯组合物上; 然后通过厚度调节装置均匀地调节细胞分散的聚氨酯组合物的厚度; 固化在前述步骤中调节的厚度的细胞分散的聚氨酯组合物，而不对组合物施加任何额外的负荷，使得形成包括聚氨酯泡沫的抛光片; 并切割抛光片。
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公开(公告)号：US20120108149A1
公开(公告)日：2012-05-03
申请号：US13294811
申请日：2011-11-11
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.
摘要翻译： 可以通过少量制造步骤制造抛光垫的方法，抛光层和缓冲层之间的高生产率和无剥离的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在将表面材料供给的同时，将细胞分散的尿烷组合物连续排出到面材上; 在细胞分散的氨基甲酸酯组合物上层压另一种面材; 固化细胞分散的聚氨酯组合物，同时控制其厚度均匀，从而形成包括聚氨酯泡沫的抛光层; 将平行于表面的抛光层切割成两片，使得同时形成各自包括抛光层和面材的两个长抛光层; 并切割长抛光层以产生抛光垫。
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公开(公告)号：US08094456B2
公开(公告)日：2012-01-10
申请号：US12095859
申请日：2007-01-09
申请人： Takeshi Fukuda , Junji Hirose , Masato Doura
发明人： Takeshi Fukuda , Junji Hirose , Masato Doura
CPC分类号： C08G18/10 , B24B37/24 , C08G18/61 , C08G2101/00 , C08G2101/0025 , Y10T29/49124 , Y10T428/31678 , C08G18/3814
摘要： To provide a polishing pad which is insusceptible to clogging of groove with abrasive particles and grinding dusts during polishing, and leads to little decrease in polishing rate even after long-term continuous use. A polishing pad of the present invention has a polishing layer formed of polyurethane resin foam having fine-cells, and asperity structure formed in a polishing surface of the polishing layer, and is featured in that the polyurethane resin foam is a reaction cured product between isocyanate-terminated prepolymer containing high-molecular-weight polyol component and isocyanate component, and a chain extender, and contains a silicon-based surfactant having combustion residue of not less than 8 wt %.
摘要翻译： 为了提供抛光垫，抛光垫不易于磨损颗粒堵塞槽和研磨粉尘，并且即使在长期连续使用后也几乎不降低抛光速率。 本发明的抛光垫具有由聚氨酯树脂发泡体形成的抛光层，其具有细小单元，并且在抛光层的研磨表面上形成凹凸结构，其特征在于，聚氨酯树脂泡沫是异氰酸酯之间的反应固化产物 含有高分子量多元醇成分和异氰酸酯成分的末端预聚物和扩链剂，含有不少于8重量％的燃烧残留物的硅系表面活性剂。
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公开(公告)号：US20080085943A1
公开(公告)日：2008-04-10
申请号：US11794284
申请日：2006-02-27
申请人： Masato Doura , Takeshi Fukuda , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
发明人： Masato Doura , Takeshi Fukuda , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
IPC分类号： C08G18/10
CPC分类号： B24B37/24 , B24D3/28 , C08G18/10 , C08G2101/00 , C08G18/3237 , C08G18/3215
摘要： A method for manufacturing a polishing pad made from a polyurethane resin foam having very uniform, fine cells therein and a polishing pad obtained by that method provides a polishing pad having better polishing characteristics (especially, in planarization) while providing improved dressability while maintaining the planarization characteristics and polishing speed of a conventional polishing pad. The polyurethane resin foam is a cured product obtained by reacting an isocyanate-terminated prepolymer with an aromatic polyamine chain extender having a melting point of 70° C. or lower, for example.
摘要翻译： 制造由其中具有非常均匀的细小单元的聚氨酯树脂泡沫制成的抛光垫的方法和通过该方法获得的抛光垫提供了一种抛光垫具有更好的抛光特性（特别是平面化）的同时提供改善的可修整性，同时保持平面化 特性和抛光速度。 聚氨酯树脂发泡体是通过将异氰酸酯封端的预聚物与熔点为70℃以下的芳香族多胺扩链剂反应得到的固化物。
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6.发明申请公开(公告)号：US20130035021A1
公开(公告)日：2013-02-07
申请号：US13634218
申请日：2011-03-17
申请人： Masato Doura , Nobuyoshi Ishizaka
发明人： Masato Doura , Nobuyoshi Ishizaka
IPC分类号： B24B37/24 , B05D3/10 , H01L21/304
CPC分类号： C08G18/797 , C08G18/2835 , C08G18/4277 , C08G18/4854 , C08G2101/0025
摘要： A polishing pad having a polishing layer comprising a thermoset polyurethane foam, wherein the thermoset polyurethane foam contains, as raw material components, an isocyanate component, and active-hydrogen-containing compounds, and the active-hydrogen-containing compounds comprise one or more polyol compounds (each) having two or more functional groups, and a monool compound having one functional group.
摘要翻译： 一种抛光垫，其具有包含热固性聚氨酯泡沫的抛光层，其中所述热固性聚氨酯泡沫以含有异氰酸酯组分和含活性氢的化合物为原料成分，所述含活性氢化合物包含一种或多种多元醇 具有两个或更多个官能团的化合物（各自）和具有一个官能团的一元醇化合物。
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公开(公告)号：US08148441B2
公开(公告)日：2012-04-03
申请号：US11794284
申请日：2006-02-27
申请人： Masato Doura , Takeshi Fukuda , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
发明人： Masato Doura , Takeshi Fukuda , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
IPC分类号： C08G18/10
CPC分类号： B24B37/24 , B24D3/28 , C08G18/10 , C08G2101/00 , C08G18/3237 , C08G18/3215
摘要： A method for manufacturing a polishing pad made from a polyurethane resin foam having very uniform, fine cells therein and a polishing pad obtained by that method provides a polishing pad having better polishing characteristics (especially, in planarization) while providing improved dressability while maintaining the planarization characteristics and polishing speed of a conventional polishing pad. The polyurethane resin foam is a cured product obtained by reacting an isocyanate-terminated prepolymer with an aromatic polyamine chain extender having a melting point of 70° C. or lower, for example.
摘要翻译： 制造由其中具有非常均匀的细小单元的聚氨酯树脂泡沫制成的抛光垫的方法和通过该方法获得的抛光垫提供了一种抛光垫具有更好的抛光特性（特别是平面化）的同时提供改善的可修整性，同时保持平面化 特性和抛光速度。 聚氨酯树脂发泡体是通过将异氰酸酯封端的预聚物与熔点为70℃以下的芳香族多胺扩链剂反应得到的固化物。
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公开(公告)号：US20100221984A1
公开(公告)日：2010-09-02
申请号：US12600201
申请日：2008-05-09
申请人： Masato Doura , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Akinori Sato
发明人： Masato Doura , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Akinori Sato
CPC分类号： B24B37/205
摘要： A method for manufacturing a polishing pad prevents slurry leaks and provides a pad that can be used to provide high optical detection accuracy. The method for manufacturing a polishing pad includes forming a groove for injecting a light-transmitting region forming material on the back surface of a polishing layer; injecting the light-transmitting region forming material into the groove and curing the material to form a light-transmitting region; and buffing the front surface of the polishing layer to expose the light-transmitting region on the front surface.
摘要翻译： 抛光垫的制造方法防止浆料泄漏并提供可用于提供高光学检测精度的垫。 抛光垫的制造方法包括在抛光层的背面上形成用于注入透光性区域形成材料的槽， 将所述透光区域形成材料注入所述凹槽中并固化所述材料以形成透光区域; 并抛光抛光层的前表面以暴露前表面上的透光区域。
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公开(公告)号：US20090093202A1
公开(公告)日：2009-04-09
申请号：US12297862
申请日：2007-04-19
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B24D11/00
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.
摘要翻译： 可以通过少量制造步骤制造抛光垫的方法，抛光层和缓冲层之间的高生产率和无剥离的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在将表面材料供给的同时，将细胞分散的尿烷组合物连续排出到面材上; 在细胞分散的氨基甲酸酯组合物上层压另一种面材; 固化细胞分散的聚氨酯组合物，同时控制其厚度均匀，从而形成包括聚氨酯泡沫的抛光层; 将平行于表面的抛光层切割成两片，使得同时形成各自包括抛光层和面材的两个长抛光层; 并切割长抛光层以产生抛光垫。
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公开(公告)号：US20090047872A1
公开(公告)日：2009-02-19
申请号：US12095859
申请日：2007-01-09
申请人： Takeshi Fukuda , Junji Hirose , Masato Doura
发明人： Takeshi Fukuda , Junji Hirose , Masato Doura
CPC分类号： C08G18/10 , B24B37/24 , C08G18/61 , C08G2101/00 , C08G2101/0025 , Y10T29/49124 , Y10T428/31678 , C08G18/3814
摘要： To provide a polishing pad which is insusceptible to clogging of groove with abrasive particles and grinding dusts during polishing, and leads to little decrease in polishing rate even after long-term continuous use. A polishing pad of the present invention has a polishing layer formed of polyurethane resin foam having fine-cells, and asperity structure formed in a polishing surface of the polishing layer, and is featured in that the polyurethane resin foam is a reaction cured product between isocyanate-terminated prepolymer containing high-molecular-weight polyol component and isocyanate component, and a chain extender, and contains a silicon-based surfactant having combustion residue of not less than 8 wt %.
摘要翻译： 为了提供抛光垫，抛光垫不易于磨损颗粒堵塞槽和研磨粉尘，并且即使在长期连续使用后也几乎不降低抛光速率。 本发明的抛光垫具有由聚氨酯树脂发泡体形成的抛光层，其具有细小单元，并且在抛光层的研磨表面上形成凹凸结构，其特征在于，聚氨酯树脂泡沫是异氰酸酯之间的反应固化产物 含有高分子量多元醇成分和异氰酸酯成分的末端预聚物和扩链剂，含有不少于8重量％的燃烧残留物的硅系表面活性剂。
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