发明申请
- 专利标题： ULTRAVIOLET IRRADIATION METHOD AND APPARATUS USING THE SAME
- 专利标题（中）： 超紫外线照射方法和使用该方法的装置
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申请号： US12242453申请日： 2008-09-30
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公开(公告)号： US20090095418A1公开(公告)日： 2009-04-16
- 发明人: Masayuki Yamamoto , Yukitoshi Hase , Takao Matsushita , Yasuji Kaneshima
- 申请人： Masayuki Yamamoto , Yukitoshi Hase , Takao Matsushita , Yasuji Kaneshima
- 优先权： JP2007-264675 20071010
- 主分类号： B29C71/04
- IPC分类号： B29C71/04
摘要：
The ultraviolet ray is applied on the surface of the protective tape from an ultraviolet ray generator. In addition, the ultraviolet ray having intensity higher than that from the ultraviolet ray generator is applied on spot on the wafer edge by an irradiation gun. In this case, the ultraviolet ray intensity and the rotation speed of the holding table are controlled by a controller so that the ultraviolet irradiation amount per unit area of the wafer edge portion becomes equal to that to the joining surface of the protective tape.
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