发明申请
- 专利标题: DIELECTRIC INTERFACE FOR GROUP III-V SEMICONDUCTOR DEVICE
- 专利标题(中): III-V族半导体器件的介电接口
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申请号: US12338839申请日: 2008-12-18
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公开(公告)号: US20090095984A1公开(公告)日: 2009-04-16
- 发明人: Justin K. Brask , Suman Datta , Mark L. Doczy , James M. Blackwell , Matthew V. Metz , Jack T. Kavalieros , Robert S. Chau
- 申请人: Justin K. Brask , Suman Datta , Mark L. Doczy , James M. Blackwell , Matthew V. Metz , Jack T. Kavalieros , Robert S. Chau
- 主分类号: H01L21/28
- IPC分类号: H01L21/28 ; H01L29/20
摘要:
A Group III-V Semiconductor device and method of fabrication is described. A high-k dielectric is interfaced to a confinement region by a chalcogenide region.
公开/授权文献
- US07989280B2 Dielectric interface for group III-V semiconductor device 公开/授权日:2011-08-02
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