发明申请
- 专利标题: SURFACE ACOUSTIC WAVE DEVICE, AND MANUFACTURING METHOD THEREFOR
- 专利标题(中): 表面声波装置及其制造方法
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申请号: US12239525申请日: 2008-09-26
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公开(公告)号: US20090096321A1公开(公告)日: 2009-04-16
- 发明人: Shunichi Aikawa , Takumi Kooriike , Jyouji Kimura
- 申请人: Shunichi Aikawa , Takumi Kooriike , Jyouji Kimura
- 申请人地址: JP Yokohama-shi
- 专利权人: FUJITSU MEDIA DEVICES LIMITED
- 当前专利权人: FUJITSU MEDIA DEVICES LIMITED
- 当前专利权人地址: JP Yokohama-shi
- 优先权: JP2007-266214 20071012
- 主分类号: H01L41/08
- IPC分类号: H01L41/08 ; H01L41/22
摘要:
A surface acoustic wave device is enable to prevent electrode erosion, without any specific environmental process. The surface acoustic wave device includes a piezoelectric substrate, an electrode for the formation of surface acoustic wave, being formed on the piezoelectric substrate, on the piezoelectric substrate, a frame-shaped layer surrounding the electrode for the formation of surface acoustic wave, and a lid body formed on the frame-shaped layer by bonding, so as to form a hollow portion between the lid body and the electrode for the formation of surface acoustic wave. The frame-shaped layer and the lid body include photosensitive resin, and the lid body includes a through hole, and the through hole is sealed with a halogen-free thermosetting resin.
公开/授权文献
- US07854050B2 Method of manufacturing a surface acoustic wave device 公开/授权日:2010-12-21
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