发明申请
- 专利标题: SILICON GERMANIUM HETEROSTRUCTURE BARRIER VARACTOR
- 专利标题(中): 硅锗锗结构障碍物
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申请号: US11876787申请日: 2007-10-23
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公开(公告)号: US20090101887A1公开(公告)日: 2009-04-23
- 发明人: Erik M. Dahlstrom , Alvin J. Joseph , Robert M. Rassel , David C. Sheridan
- 申请人: Erik M. Dahlstrom , Alvin J. Joseph , Robert M. Rassel , David C. Sheridan
- 主分类号: H01L29/12
- IPC分类号: H01L29/12 ; H01L21/329
摘要:
Methods and heterostructure barrier varactor (HBV) diodes optimized for application with frequency multipliers at providing outputs at submillimeter wave frequencies and above. The HBV diodes include a silicon-containing substrate, an electrode over the silicon-containing substrate, and one or more heterojunction quantum wells of alternating layers of Si and SiGe of one or more electrodes of the diode. Each SiGe quantum well preferably has a floating SiGe layer between adjacent SiGe gradients followed by adjacent Si layers, such that, a single homogeneous structure is provided characterized by having no distinct separations. The plurality of Si/SiGe heterojunction quantum wells may be symmetric or asymmetric.
公开/授权文献
- US07696604B2 Silicon germanium heterostructure barrier varactor 公开/授权日:2010-04-13
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