发明申请
- 专利标题: Thin film transistor and method for manufaturing thereof
- 专利标题(中): 薄膜晶体管及其制造方法
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申请号: US12221615申请日: 2008-08-05
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公开(公告)号: US20090101903A1公开(公告)日: 2009-04-23
- 发明人: Po-Lin Chen , Kuo-Yuan Tu , Wen-Ching Tsai , Chun-Nan Lin , Shu-Feng Wu
- 申请人: Po-Lin Chen , Kuo-Yuan Tu , Wen-Ching Tsai , Chun-Nan Lin , Shu-Feng Wu
- 专利权人: AU Optronics Corporation
- 当前专利权人: AU Optronics Corporation
- 优先权: TW96139559 20071022
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L21/00
摘要:
A thin-film transistor (TFT) includes a gate electrode, a gate dielectric layer, a semiconductor layer, source/drain electrodes, a passivation layer and a protection layer. The gate electrode is disposed on a substrate. The gate dielectric layer covers the gate electrode and the substrate. The semiconductor layer is disposed on the gate dielectric layer and above the gate electrode. The semiconductor layer has a channel region disposed above the gate electrode and source/drain regions disposed at both sides of the channel region. The source/drain electrodes are disposed on the source/drain regions of the semiconductor layer and each has a barrier layer disposed on the source/drain regions of the semiconductor layer and a conductive layer disposed on the barrier layer. The passivation layer is disposed over the surface of the source/drain electrodes. The protection layer is disposed over the substrate, the passivation layer, and the channel region of the semiconductor layer.
公开/授权文献
- US08760593B2 Thin film transistor and method for manufacturing thereof 公开/授权日:2014-06-24
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