摘要:
A nuclear battery module is adapted for a nuclear battery. The nuclear battery module includes a radioactive unit and at least one energy conversion unit. The radioactive unit includes a soft substrate and at least one radioactive layer disposed on the soft substrate. The at least one radioactive layer includes a β-ray source. The at least one energy conversion unit includes a flexible carrier layer, an N-type semiconductor layer disposed on the flexible carrier layer, and a P-type semiconductor layer disposed on the N-type semiconductor layer opposite to the flexible carrier layer. The at least one energy conversion unit is disposed on the radioactive unit in a manner such that the flexible carrier layer is proximate to the radioactive unit.
摘要:
A fabricating method of an active device array substrate is provided. The active device array substrate has at least one patterned conductive layer. The patterned conductive layer includes a copper layer. A cross-section of the copper layer which is parallel to a normal line direction of the copper layer includes a first trapezoid and a second trapezoid stacked on the first trapezoid. A base angle of the first trapezoid and a base angle of the second trapezoid are acute angles, and a difference between the base angle of the first trapezoid and the base angle of the second trapezoid is from about 5° to about 30°.
摘要:
A display element and a method of manufacturing the same are provided. The method comprises the following steps: forming a first patterned conducting layer with a gate on a substrate and a dielectric layer thereon; forming a patterned semiconductor layer on the dielectric layer, wherein the patterned semiconductor layer has a channel region, a source and a drain, and wherein the source and the drain lie on the opposite sides of the channel region; selectively depositing a barrier layer, which only wraps the patterned semiconductor layer; forming a second patterned conducting layer on the barrier layer and above the source and the drain. In the display element manufactured by the method, the barrier layer only wraps the patterned semiconductor layer.
摘要:
The present invention discloses a thin film transistor and an active matrix flat display device, the thin film transistor comprising a gate electrode, a first insulating layer, a source electrode, a drain, and multiple oxide semiconductor layers, wherein, the multiple oxide semiconductor layers sequentially laminate between the source electrode, the drain electrode and the first insulating layer and comprise a first oxide semiconductor layer disposed close to the first layer and a second oxide semiconductor layer electrically connected with the source electrode and the drain electrode, and the resistivity of the first oxide semiconductor layer greater than 104 Ω·cm, the resistivity of the second oxide semiconductor layer smaller than 1 Ω·cm. Therefore, it ensures normal operation of the thin film transistor in order to ensure the display quality of the active matrix flat panel display device.
摘要:
A pixel structure disposed on a substrate including a thin film transistor (TFT), a bottom capacitor electrode, a dielectric layer, an upper capacitor electrode, a passivation layer, and a pixel electrode is provided. The TFT having a source/drain and the bottom capacitor electrode are disposed on the substrate. The dielectric layer is disposed on the bottom capacitor electrode. The upper capacitor electrode has a semiconductor layer, a barrier layer, and a metal layer. The semiconductor layer is disposed on the dielectric layer above the bottom capacitor electrode. The barrier layer is disposed on the semiconductor layer. The metal layer whose material includes copper, a copper alloy, or a combination thereof is disposed on the barrier layer. The passivation layer covers the TFT and the upper capacitor electrode and has a first opening exposing the source/drain. The pixel electrode is electrically connected to the TFT through the first opening.
摘要:
A display element and a method of manufacturing the same are provided. The method comprises the following steps: forming a first patterned conducting layer with a gate on a substrate and a dielectric layer thereon; forming a patterned semiconductor layer on the dielectric layer, wherein the patterned semiconductor layer has a channel region, a source and a drain, and wherein the source and the drain lie on the opposite sides of the channel region; selectively depositing a barrier layer, which only wraps the patterned semiconductor layer; forming a second patterned conducting layer on the barrier layer and above the source and the drain. In the display element manufactured by the method, the barrier layer only wraps the patterned semiconductor layer.
摘要:
A piston used in a vehicle air-compressor or a vehicle suspension system can be dismantled by a dismantling tool so that cost for a repair is reduced while components are replaceable instead of the whole piston.
摘要:
A thin-film transistor (TFT) includes a gate electrode, a gate dielectric layer, a semiconductor layer, source/drain electrodes, a passivation layer and a protection layer. The gate electrode is disposed on a substrate. The gate dielectric layer covers the gate electrode and the substrate. The semiconductor layer is disposed on the gate dielectric layer and above the gate electrode. The semiconductor layer has a channel region disposed above the gate electrode and source/drain regions disposed at both sides of the channel region. The source/drain electrodes are disposed on the source/drain regions of the semiconductor layer and each has a barrier layer disposed on the source/drain regions of the semiconductor layer and a conductive layer disposed on the barrier layer. The passivation layer is disposed over the surface of the source/drain electrodes. The protection layer is disposed over the substrate, the passivation layer, and the channel region of the semiconductor layer.
摘要:
A piston, used in a vehicle air-compressor or a vehicle suspension system, can be dismantled by a dismantling tool so that cost for a repair is reduced while components are replaced instead of the whole piston.
摘要:
The present invention discloses a manufacturing method for a switch and an array substrate. The method comprises: firstly, forming sequentially a first metal layer, an insulating layer, a semiconductor layer, an ohmic contact layer, a second metal layer, a third metal layer and a photoresist layer on a base substrate; after patterning the photoresist layer, etching the third metal layer and the second metal layer to form the input electrode and the output electrode of the switch; using a stripper comprising at least 30% by weight of amine in order to remove the photoresist layer and the residual second metal layer; and finally, etching the ohmic contact layer. Through the above steps, the present invention can avoid the electrical abnormality of the switch and increase process yield of the array substrate.