发明申请
- 专利标题: SHOWER PLATE AND SUBSTRATE PROCESSING APPARATUS
- 专利标题(中): 淋浴板和底板加工设备
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申请号: US12266800申请日: 2008-11-07
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公开(公告)号: US20090120582A1公开(公告)日: 2009-05-14
- 发明人: Chishio Koshimizu , Kazuki Denpoh , Hiromasa Mochiki
- 申请人: Chishio Koshimizu , Kazuki Denpoh , Hiromasa Mochiki
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-291064 20071108
- 主分类号: H01L21/3065
- IPC分类号: H01L21/3065
摘要:
A shower plate of a processing gas supply unit disposed in a processing chamber of a substrate processing apparatus to supply a processing gas into a processing space in the processing chamber. The shower plate is interposed between a processing gas introduction space formed in the processing gas supply unit for introduction of the processing gas and the processing space. The shower plate includes processing gas supply passageways which allow the processing gas introduction space to communicate with the processing space. The processing gas supply passageways include gas holes formed toward the processing gas introduction space and gas grooves formed toward the processing space, the gas holes and gas grooves communicating with each other. A total flow path cross sectional area of all the gas grooves is larger than a total flow path cross sectional area of all the gas holes.
公开/授权文献
- US09136097B2 Shower plate and substrate processing apparatus 公开/授权日:2015-09-15
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