发明申请
US20090123057A1 Method and System for Obtaining Bounds on Process Parameters for OPC-Verification 有权
用于获取OPC验证过程参数边界的方法和系统

Method and System for Obtaining Bounds on Process Parameters for OPC-Verification
摘要:
Embodiments of the present invention provide a method of performing printability verification of a mask layout. The method includes creating one or more tight clusters; computing a set of process parameters associated with a point on said mask; comparing said set of process parameters to said one or more tight clusters; and reporting an error when at least one of said process parameters is away from said one or more tight clusters.
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