发明申请
- 专利标题： EXPOSURE APPARATUS
- 专利标题（中）： 曝光装置
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申请号： US12129273申请日： 2008-05-29
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公开(公告)号： US20090135383A1公开(公告)日： 2009-05-28
- 发明人: Keiji Emoto
- 申请人： Keiji Emoto
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-155376 20070612
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
An exposure apparatus including a moving member movable with a substrate, an interferometer configured to measure a position of the moving member, a blower device for blowing temperature-conditioned air, a plurality of supply openings communicating with the blower device, and a flow rate adjusting device configured to adjust a gas flow rate blown through the plurality of supply openings based on an operation of the moving member.
公开/授权文献
- US07982849B2 Exposure apparatus 公开/授权日：2011-07-19
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