公开(公告)号：US08102500B2

公开(公告)日：2012-01-24

申请号：US11751225

申请日：2007-05-21

申请人： Hitoshi Sato ,  Yasuhito Sasaki ,  Keiji Emoto

发明人： Hitoshi Sato ,  Yasuhito Sasaki ,  Keiji Emoto

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/62 ,  H01B7/295 ,  H02K41/02

CPC分类号： G03F7/70858 ,  G03F7/70725

摘要： A stage device includes a base, and a stage movable portion being movable along a surface of the base. An interferometer measures a position of the stage movable portion, and at least one of a piping element and a wiring element is connected to the stage movable portion. An auxiliary member holds the piping element or the wiring element. The auxiliary member surrounds at least a portion of the piping element or the wiring element and is flexible, to be bent in accordance with the bending of the piping element or the wiring element, and a heat insulating material, held by the auxiliary member, reduces heat to be transferred from the piping element or the wiring element to a space through which measurement light of the interferometer passes.

摘要翻译： 舞台装置包括底座以及可沿着底座的表面移动的舞台可动部分。 干涉仪测量舞台可动部分的位置，并且管道元件和配线元件中的至少一个连接到舞台可移动部分。 辅助构件保持管道元件或布线元件。 辅助构件围绕管道元件或布线元件的至少一部分，并且是柔性的，根据管道元件或布线元件的弯曲而弯曲，并且由辅助构件保持的隔热材料减少 要从管道元件或布线元件转移到干涉仪的测量光通过的空间。

公开(公告)号：US07982849B2

公开(公告)日：2011-07-19

申请号：US12129273

申请日：2008-05-29

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/60

CPC分类号： G03F7/70858 ,  G03F7/70725

摘要： An exposure apparatus including a moving member movable with a substrate, an interferometer configured to measure a position of the moving member, a blower device for blowing temperature-conditioned air, a plurality of supply openings communicating with the blower device, and a flow rate adjusting device configured to adjust a gas flow rate blown through the plurality of supply openings based on an operation of the moving member.

摘要翻译： 一种曝光装置，包括可移动的基板的移动部件，被配置为测量移动部件的位置的干涉仪，用于吹送温度调节的空气的鼓风装置，与鼓风装置连通的多个供给开口，以及流量调节 被配置为基于所述移动构件的操作来调节吹过所述多个供给口的气体流量。

公开(公告)号：US20090237638A1

公开(公告)日：2009-09-24

申请号：US12409401

申请日：2009-03-23

申请人： Tomofumi Nishikawara ,  Keiji Emoto ,  Tatsuya Hayashi ,  Keiji Yamashita

发明人： Tomofumi Nishikawara ,  Keiji Emoto ,  Tatsuya Hayashi ,  Keiji Yamashita

IPC分类号： G03B27/58

CPC分类号： G03B27/58 ,  G03F7/70341

摘要： An exposure apparatus for exposing a substrate through liquid includes a stage for holding and moving the substrate. The stage includes a holding section for holding the substrate and a supporting section disposed around the holding section. The supporting section includes a recovery port including a gap between the substrate held by the holding section and the supporting section, the recovery port for recovering the liquid, a space for storing the liquid recovered through the recovery port, a liquid recovery mechanism for draining the liquid that has collected in a lower part of the space, and a sloshing reduction member disposed in the space, the sloshing reduction member for reducing sloshing of the liquid.

摘要翻译： 用于通过液体曝光衬底的曝光装置包括用于保持和移动衬底的台。 该平台包括用于保持基板的保持部和设置在保持部周围的支撑部。 支撑部包括回收口，该回收口包括由保持部保持的基板与支撑部之间的间隙，用于回收液体的回收口，用于储存通过回收口回收的液体的空间;液体回收机构， 已经收集在该空间的下部的液体，以及设置在该空间中的晃动减少构件，该减震构件用于减少液体的晃动。

公开(公告)号：US20090034150A1

公开(公告)日：2009-02-05

申请号：US12244874

申请日：2008-10-03

申请人： Atsushi Ito ,  Keiji Emoto

发明人： Atsushi Ito ,  Keiji Emoto

IPC分类号： H01L21/683

CPC分类号： H01L21/683 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  H01L21/6831 ,  H01L21/6838

摘要： A substrate holding system including a substrate attracting device, an exhausting device, and a control device to operate the exhausting device so that a pressure around the substrate and a pressure at an interval between the substrate and the substrate attracting device are lowered to a first pressure and that only the pressure at the interval is subsequently lowered to a second pressure, which is lower than the first pressure.

摘要翻译： 一种基板保持系统，包括基板吸引装置，排气装置和控制装置，以操作排气装置，使得基板周围的压力和基板和基板吸引装置之间的间隔处的压力降低到第一压力 并且只有间隔处的压力随后降低到低于第一压力的第二压力。

公开(公告)号：US07388307B2

公开(公告)日：2008-06-17

申请号：US11126365

申请日：2005-05-11

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： H02K41/00

CPC分类号： G03F7/70758 ,  H02K41/03 ,  H02K2201/18

摘要： A stage apparatus includes a movable element including a plurality of magnets, a stage fixed to the movable element, and a stator configured with layers of coils arranged opposite to the magnets with a gap, in which (i) respective layers of coils serve as a plurality of driving axes for driving the movable element in two-dimensional directions, (ii) the stage apparatus generates a driving force in the movable stage by applying power to coils corresponding to respective layers, (iii) a conductive area of a section having a normal coil in a coil winding direction is made so that heat generation amounts of coils corresponding to the respective layers are substantially equal, and (iv) the conductive area of the section having a normal in the coil winding direction in the respective layers of coils is made relatively larger than coils having a smaller driving force constant.

摘要翻译： 舞台装置包括可移动元件，其包括多个磁体，固定到可动元件的平台，以及定子，该定子配置有与磁体相对的带有间隙的线圈，其中（i）各个线圈层用作 多个用于在二维方向上驱动可动元件的驱动轴，（ii）舞台装置通过向与各个层相对应的线圈施加电力来产生可动载物台的驱动力，（iii）具有 进行线圈卷绕方向的正常线圈，使得与各层对应的线圈的发热量基本相等，（iv）线圈卷绕方向的截面的导电面积各线圈的面积为 比具有较小驱动力常数的线圈相对较大。

公开(公告)号：US20080111979A1

公开(公告)日：2008-05-15

申请号：US11925579

申请日：2007-10-26

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： In a liquid-immersion exposure method and a liquid-immersion exposure apparatus, on the basis of a liquid repellency distribution at a surface which an immersion liquid contacts as a result of a movement of a stage, a path where a movement time of the stage becomes the shortest is calculated, so that the stage is moved along this path.

摘要翻译： 在浸液曝光方法和浸液曝光装置中，基于浸没液体由于台的移动而接触的表面的拒液性分布，其中阶段的移动时间 成为最短的计算，使舞台沿这条路线移动。

公开(公告)号：US07292426B2

公开(公告)日：2007-11-06

申请号：US10952732

申请日：2004-09-30

申请人： Atsushi Ito ,  Keiji Emoto

发明人： Atsushi Ito ,  Keiji Emoto

IPC分类号： H01T23/00

CPC分类号： H01L21/683 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  H01L21/6831 ,  H01L21/6838

摘要： A substrate holding system having a chuck for vacuum attraction and electrostatic attraction of a substrate. The system includes a ring-like rim for carrying a substrate thereon, a plurality of first protrusions disposed inside the rim, for carrying the substrate thereon, and a plurality of second protrusions disposed inside the rim, for carrying the substrate thereon. A substrate carrying surface area of at least one first protrusion is smaller than a substrate carrying surface area of at least one second protrusion and a smallest interval between the first protrusions is smaller than a smallest interval between the second protrusions. Also included are an exhaust system for exhausting a clearance between the chuck and the substrate, an electrode for electrostatic attraction, a power supplying system for supplying power to the electrode, a measuring system for measuring a pressure in the clearance, and a control system for controlling the power supply.

摘要翻译： 一种基板保持系统，具有用于基板的真空吸引和静电吸引的卡盘。 该系统包括用于在其上承载基板的环状边缘，设置在边缘内部的多个第一突起，用于在其上承载基板，以及设置在边缘内的多个第二突起，用于在其上承载基板。 至少一个第一突起的承载表面积的基板小于至少一个第二突起的承载表面积的基板，并且第一突起之间的最小间隔小于第二突起之间的最小间隔。 还包括用于排出卡盘和基板之间的间隙的排气系统，用于静电吸引的电极，用于向电极供电的供电系统，用于测量间隙中的压力的​​测量系统，以及用于 控制电源。

公开(公告)号：US20060187438A1

公开(公告)日：2006-08-24

申请号：US11407059

申请日：2006-04-20

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G03B27/58

CPC分类号： G03F7/70525 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70858 ,  G03F7/70875 ,  G03F7/70891

摘要： An exposure apparatus including an illumination optical unit for irradiating exposure light, a stage for mounting a substrate and moving the substrate, a driving unit for driving the stage, a heater for applying heat to the stage, and a heat generation amount control unit for controlling heat generation amount to suppress a temperature change of the stage before or after driving of the driving unit or a temperature change of the stage before or after irradiating of the illumination optical unit.

摘要翻译： 一种曝光装置，包括用于照射曝光光的照明光学单元，用于安装基板并移动基板的台，用于驱动平台的驱动单元，向台架施加热量的加热器和用于控制的发热量控制单元 用于抑制在驱动单元驱动之前或之后的台的温度变化或在照明光学单元的照射之前或之后的台的温度变化的发热量。

公开(公告)号：US20050285451A1

公开(公告)日：2005-12-29

申请号：US11138567

申请日：2005-05-27

申请人： Hiroyoshi Kubo ,  Keiji Emoto

发明人： Hiroyoshi Kubo ,  Keiji Emoto

IPC分类号： G03F7/20 ,  H02K1/22 ,  H02K3/24 ,  H02K41/00 ,  H02K41/03

CPC分类号： G03F7/70758 ,  H02K3/24 ,  H02K41/03

摘要： In a linear motor, each arrayed coil unit (160) of a stator yoke (151) is divided into an upper coil (161) and lower coil (162). A cooling pipe (153) is interposed between the upper coil (161) and the lower coil (162).

摘要翻译： 在线性电动机中，定子磁轭（151）的每个排列的线圈单元（160）被分成上部线圈（161）和下部线圈（162）。 在上部线圈（161）和下部线圈（162）之间插入冷却管（153）。

公开(公告)号：US20050280790A1

公开(公告)日：2005-12-22

申请号：US11193486

申请日：2005-08-01

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： C21B7/24 ,  G03B27/42 ,  G03C5/00 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70808 ,  G03F7/70716 ,  G03F7/70841 ,  G03F7/70858

摘要： An apparatus for processing an object includes a vessel which forms a pressure-reduced inner space and accommodates the object, a member which is supported by an inner side of the vessel through a heat insulator, and a temperature adjusting portion which adjusts a temperature of the member.

摘要翻译： 用于处理物体的装置包括形成减压内部空间并容纳物体的容器，通过隔热件由容器的内侧支撑的构件和调节温度的温度调节部 会员。