发明申请
- 专利标题: METHOD OF MANUFACTURING A WIRING SUBSTRATE AND SEMICONDUCTOR DEVICE
- 专利标题(中): 制造接线基板和半导体器件的方法
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申请号: US12340267申请日: 2008-12-19
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公开(公告)号: US20090137085A1公开(公告)日: 2009-05-28
- 发明人: Jun TSUKANO , Kenta Ogawa , Takehiko Maeda , Shintaro Yamamichi , Katsumi Kikuchi
- 申请人: Jun TSUKANO , Kenta Ogawa , Takehiko Maeda , Shintaro Yamamichi , Katsumi Kikuchi
- 申请人地址: JP Kawasaki JP Tokyo
- 专利权人: NEC ELECTRONICS CORPORATION,NEC CORPORATION
- 当前专利权人: NEC ELECTRONICS CORPORATION,NEC CORPORATION
- 当前专利权人地址: JP Kawasaki JP Tokyo
- 优先权: JP2006-194353 20060714
- 主分类号: H01L21/58
- IPC分类号: H01L21/58
摘要:
A wiring substrate includes a base insulating film, a first interconnection formed on a top surface side of the base insulating film, a via conductor provided in a via hole formed in the base insulating film, and a second interconnection provided on a bottom surface side of the base insulating film, the second interconnection being connected to the first interconnection via the via conductor. The wiring substrate includes divided-substrate-unit regions, in each of which the first interconnection, the via conductor, and the second interconnection are formed. The wiring substrate includes a warpage-controlling pattern on the base insulating film, and has a warped shape such that when the wiring substrate is left at rest on a horizontal plate, at least a central part of each side of a plane surface of the substrate contacts the horizontal plate, with both ends of the side raised, where each of the sides extends along a second direction perpendicular to a first direction in the plane surface of the substrate.
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