发明申请
US20090146190A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR MEMORY DEVICE
有权
用于制造半导体存储器件的半导体存储器件和方法
- 专利标题: SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR MEMORY DEVICE
- 专利标题(中): 用于制造半导体存储器件的半导体存储器件和方法
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申请号: US12325711申请日: 2008-12-01
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公开(公告)号: US20090146190A1公开(公告)日: 2009-06-11
- 发明人: Yoshiaki FUKUZUMI , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
- 申请人: Yoshiaki FUKUZUMI , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
- 申请人地址: JP TOKYO
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP TOKYO
- 优先权: JP2007-311340 20071130
- 主分类号: H01L27/115
- IPC分类号: H01L27/115 ; H01L21/8247
摘要:
According to an aspect of the present invention, there is provided a nonvolatile semiconductor memory device, comprising a plurality of memory strings, each of the memory strings being constituted with a plurality of electrically erasable memory cells being serially connected each other, the memory strings comprising: a columnar semiconductor layer perpendicularly extending toward a substrate; a plurality of conductive layers being formed in parallel to the substrate and including a first space between a sidewall of the columnar semiconductor layers; and characteristic change layer being formed on the sidewall of the columnar semiconductor layer faced to the first space or a sidewall of the conductive layer faced to the first space and changing characteristics accompanying with applied voltage; wherein the plurality of the conductive layers have a function of a relative movement to a prescribed direction for the columnar semiconductor layer.
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