发明申请
- 专利标题： ANTI-REFLECTION PLATE AND METHOD FOR MANUFACTURING ANTI-REFLECTION STRUCTURE THEREOF
- 专利标题（中）： 防反射板及其反制结构的制造方法
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申请号： US12343540申请日： 2008-12-24
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公开(公告)号： US20090169822A1公开(公告)日： 2009-07-02
- 发明人: Chih-Wei Chen , Chin-Jyi Wu , Wen-Tzong Hsieh , Wen-Tung Hsu , Chun-Hung Lin
- 申请人： Chih-Wei Chen , Chin-Jyi Wu , Wen-Tzong Hsieh , Wen-Tung Hsu , Chun-Hung Lin
- 申请人地址： TW Hsinchu
- 专利权人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人地址： TW Hsinchu
- 优先权： TW96150625 20071227; TW97149294 20081217
- 主分类号： B32B5/18
- IPC分类号： B32B5/18 ; B05D1/00 ; B05D1/08 ; B05D1/04 ; B32B3/00
摘要：
A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.
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