发明申请
- 专利标题： Environmental system including vacuum scavenge for an immersion lithography apparatus
- 专利标题（中）： 包括用于浸没式光刻设备的真空清除的环境系统
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申请号： US12382661申请日： 2009-03-20
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公开(公告)号： US20090180096A1公开(公告)日： 2009-07-16
- 发明人: Andrew J. Hazelton , Michael Sogard
- 申请人： Andrew J. Hazelton , Michael Sogard
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 主分类号： G03B27/58
- IPC分类号： G03B27/58
摘要：
A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a removing inlet which removes the liquid from a gap between the liquid confinement member and the substrate. The liquid containment system also includes an actuator by which the liquid containment member is moved.
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