发明申请
US20090187869A1 Budgeting Electromigration-Related Reliability Among Metal Paths In The Design Of A Circuit 有权
电路设计中金属路径的电子迁移相关可靠性预算

Budgeting Electromigration-Related Reliability Among Metal Paths In The Design Of A Circuit
摘要:
Apportioning unequally contributions of different metal paths of a circuit to electromigration (EM) reliability. In an embodiment, a corresponding parameter value representing a magnitude of excess current flowing in a single direction in each metal path is determined. A desired reliability measure for electromigration (EM) is apportioned among the metal paths based on computed parameter values for the corresponding metal path. A reliability analysis for the circuit is performed based on the apportioning. In an embodiment, metal paths which predominantly carry currents with an average value less than a threshold are excluded from being considered as contributors to EM degradation.
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