发明申请
- 专利标题: NON-VOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 非易失性存储器件及其制造方法
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申请号: US12362277申请日: 2009-01-29
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公开(公告)号: US20090189137A1公开(公告)日: 2009-07-30
- 发明人: Masaharu Kinoshita , Motoyasu Terao , Hideyuki Matsuoka , Yoshitaka Sasago , Yoshinobu Kimura , Akio Shima , Mitsuharu Tai , Norikatsu Takaura
- 申请人: Masaharu Kinoshita , Motoyasu Terao , Hideyuki Matsuoka , Yoshitaka Sasago , Yoshinobu Kimura , Akio Shima , Mitsuharu Tai , Norikatsu Takaura
- 专利权人: HITACHI, LTD.
- 当前专利权人: HITACHI, LTD.
- 优先权: JP2008-017013 20080129
- 主分类号: H01L47/00
- IPC分类号: H01L47/00
摘要:
In a phase change memory, electric property of a diode used as a selection device is extremely important. However, since crystal grain boundaries are present in the film of a diode using polysilicon, it involves a problem that the off leak property varies greatly making it difficult to prevent erroneous reading. For overcoming the problem, the present invention provides a method of controlling the temperature profile of an amorphous silicon in the laser annealing for crystallizing and activating the amorphous silicon thereby controlling the crystal grain boundaries. According to the invention, variation in the electric property of the diode can be decreased and the yield of the phase-change memory can be improved.
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