发明申请
- 专利标题: Photosensitive Resin Composition and Photosensitive Film
- 专利标题(中): 感光树脂组合物和感光膜
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申请号: US12226227申请日: 2007-04-24
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公开(公告)号: US20090191385A1公开(公告)日: 2009-07-30
- 发明人: Kuon Miyazaki , Takashi Hayakawa
- 申请人: Kuon Miyazaki , Takashi Hayakawa
- 申请人地址: JP Osaka
- 专利权人: ASAHI KASEI KABUSHIKI KAISHA
- 当前专利权人: ASAHI KASEI KABUSHIKI KAISHA
- 当前专利权人地址: JP Osaka
- 优先权: JP2006-126623 20060428; JP2006-205394 20060727
- 国际申请: PCT/JP2007/058861 WO 20070424
- 主分类号: B32B3/10
- IPC分类号: B32B3/10 ; G03F7/039 ; G03F7/20
摘要:
Disclosed is a photosensitive resin composition comprising an alkali-soluble resin, wherein the dissolution rate of the alkali-soluble resin in an aqueous sodium carbonate solution is not less than 0.04 μm/sec. When a photosensitive layer having a thickness of 30 μm is formed by applying the photosensitive resin composition onto a base and removing the solvent by heating, and thus-obtained photosensitive layer is irradiated with an active ray of 1000 mJ/cm2 or less, the dissolution rate of the portion irradiated with the active ray in the photosensitive layer made of the photosensitive resin composition is not less than 0.22 μm/sec and the film residual rate of the portion not irradiated with the active ray is not less than 90%.
公开/授权文献
- US08187788B2 Photosensitive resin composition and photosensitive film 公开/授权日:2012-05-29