- 专利标题： METHOD TO FORM A PHOTOVOLTAIC CELL COMPRISING A THIN LAMINA
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申请号： US12209364申请日： 2008-09-12
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公开(公告)号： US20090197367A1公开(公告)日： 2009-08-06
- 发明人: Srinivasan Sivaram , Aditya Agarwal , S. Brad Herner , Christopher J. Petti
- 申请人： Srinivasan Sivaram , Aditya Agarwal , S. Brad Herner , Christopher J. Petti
- 申请人地址： US CA San Jose
- 专利权人： TWIN CREEKS TECHNOLOGIES, INC.
- 当前专利权人： TWIN CREEKS TECHNOLOGIES, INC.
- 当前专利权人地址： US CA San Jose
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.
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