发明申请
- 专利标题: NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 非挥发性半导体存储器件及其制造方法
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申请号: US12392636申请日: 2009-02-25
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公开(公告)号: US20090230458A1公开(公告)日: 2009-09-17
- 发明人: Megumi ISHIDUKI , Hideaki Aochi , Ryota Katsumata , Hiroyasu Tanaka , Masaru Kidoh , Masaru Kito , Yoshiaki Fukuzumi , Yosuke Komori , Yasuyuki Matsuoka
- 申请人: Megumi ISHIDUKI , Hideaki Aochi , Ryota Katsumata , Hiroyasu Tanaka , Masaru Kidoh , Masaru Kito , Yoshiaki Fukuzumi , Yosuke Komori , Yasuyuki Matsuoka
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-65886 20080314
- 主分类号: H01L29/792
- IPC分类号: H01L29/792 ; H01L21/28
摘要:
A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a columnar semiconductor layer extending in a direction perpendicular to a substrate; a plurality of conductive layers formed at a sidewall of the columnar semiconductor layer via memory layers; and interlayer insulation layers formed above of below the conductive layers. A sidewall of the conductive layers facing the columnar semiconductor layer is formed to be inclined such that the distance thereof from a central axis of the columnar semiconductor layer becomes larger at lower position thereof than at upper position thereof. While, a sidewall of the interlayer insulation layers facing the columnar semiconductor layer is formed to be inclined such that the distance thereof from a central axis of the columnar semiconductor layer becomes smaller at lower position thereof than at upper position thereof.
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