发明申请
- 专利标题: METHOD OF MANUFACTURING WIRING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- 专利标题(中): 制造接线基板的方法及制造半导体器件的方法
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申请号: US12403456申请日: 2009-03-13
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公开(公告)号: US20090236024A1公开(公告)日: 2009-09-24
- 发明人: Mitsutoshi HIGASHI , Kei Murayama , Masahiro Sunohara , Hideaki Sakaguchi
- 申请人: Mitsutoshi HIGASHI , Kei Murayama , Masahiro Sunohara , Hideaki Sakaguchi
- 申请人地址: JP Nagano-shi
- 专利权人: Shinko Electric Industries Co., Ltd.
- 当前专利权人: Shinko Electric Industries Co., Ltd.
- 当前专利权人地址: JP Nagano-shi
- 优先权: JPP2008-076823 20080324
- 主分类号: H05K3/10
- IPC分类号: H05K3/10 ; B32B37/00
摘要:
A method of manufacturing a wiring substrate is disclosed. The method includes: (a) preparing a supporting substrate including a main body and a through electrode penetrating the main body, wherein the supporting substrate includes a first surface and a second surface opposite to the first surface, and a trace is formed on the second surface of the supporting substrate; (b) forming a build-up wiring structure by alternately forming a wiring layer and an insulating layer on the first surface of the supporting substrate; and (c) obtaining a wiring substrate by separating the build-up wiring structure from the supporting substrate. Step (b) includes: forming the wiring layer using the through electrode as a power feeding wiring, and step (c) includes: peeling the build-up wiring structure from the supporting substrate to obtain the wiring substrate.
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