发明申请
- 专利标题: Prototyping station for atomic force microscope-assisted deposition of nanostructures
- 专利标题(中): 原子力显微镜辅助沉积纳米结构原型台
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申请号: US12383467申请日: 2009-03-23
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公开(公告)号: US20090241232A1公开(公告)日: 2009-09-24
- 发明人: James F. Mack , Neil Dasgupta , Timothy P. Holme , Friedrich B. Prinz , Andrei Iancu , Wonyoung Lee
- 申请人: James F. Mack , Neil Dasgupta , Timothy P. Holme , Friedrich B. Prinz , Andrei Iancu , Wonyoung Lee
- 主分类号: G12B21/04
- IPC分类号: G12B21/04 ; G12B21/08
摘要:
A localized nanostructure growth apparatus that has a partitioned chamber is provided, where a first partition includes a scanning probe microscope (SPM) and a second partition includes an atomic layer deposition (ALD) chamber, where the first partition is hermetically isolated from the second partition, and at least one SPM probe tip of the SPM is disposed proximal to a sample in the ALD chamber. According to the invention, the hermetic isolation between the chambers prevents precursor vapor from damaging critical microscope components and ensuring that contaminants in the ALD chamber can be minimized.