发明申请
- 专利标题： Charged particle beam equipment
- 专利标题（中）： 带电粒子束设备
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申请号： US12081969申请日： 2008-04-24
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公开(公告)号： US20090242794A1公开(公告)日： 2009-10-01
- 发明人: Hiromi Inada , Hiroyuki Tanaka , Shun-ichi Watanabe , Shigeto Isakozawa , Mitsugu Sato , Atsushi Takane , Satoshi Yamaguchi
- 申请人： Hiromi Inada , Hiroyuki Tanaka , Shun-ichi Watanabe , Shigeto Isakozawa , Mitsugu Sato , Atsushi Takane , Satoshi Yamaguchi
- 申请人地址： JP Tokyo
- 专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2005-108765 20050405
- 主分类号： G21K5/10
- IPC分类号： G21K5/10 ; G01K1/08
摘要：
Charged particle beam equipment has a processing unit for calibrating dimension values of an enlarged specimen image, and means for changing the amount by which a charged particle beam is scanned. Also, a specimen stand has a mechanism for holding a specimen having a periodical structure or a specimen simultaneously having a periodical structure and a non-periodical structure, and a storage device for automatically changing a magnification for an enlarged specimen image, and storing measured values at all magnifications.
公开/授权文献
- US07923701B2 Charged particle beam equipment 公开/授权日：2011-04-12