A semiconductor memory device has side surfaces of neighboring bit lines that do not face each other to reduce a capacitance of a parasitic capacitor formed between adjacent bit lines. The semiconductor memory device includes contact plugs formed on a semiconductor substrate. Each contact plug is disposed between gate patterns. First and second conductive pads extend in different directions and are connected to the contact plugs. First and second pad contact plugs are formed on extended peripheries of the first and second conductive pads, respectively. Each of the first pad contact plugs has a height which differs from a height of each of the second pad contact plugs. First bit lines are connected to the first pad contact plugs, and second bit lines are connected to the second pad contact plugs.