发明申请
- 专利标题： RESIST POLYMER AND RESIST COMPOSITION
- 专利标题（中）： 耐聚合物和耐腐蚀组合物
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申请号： US12496232申请日： 2009-07-01
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公开(公告)号： US20090263743A1公开(公告)日： 2009-10-22
- 发明人: Hikaru MOMOSE , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
- 申请人： Hikaru MOMOSE , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
- 申请人地址： JP Tokyo
- 专利权人： Mitsubishi Rayon Co., Ltd.
- 当前专利权人： Mitsubishi Rayon Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2003-024238 20030131; JP2003-136303 20030514; JP2003-344750 20031002; JP2003-401988 20031201
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; C08F24/00 ; C08F10/00 ; G03F7/004
摘要：
The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
公开/授权文献
- US08092979B2 Resist polymer and resist composition 公开/授权日：2012-01-10
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