摘要:
The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
摘要:
A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is of formula (1): wherein R1 represents a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms, or a linear or branched alkyl group containing 1 to 6 carbon atoms which has a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms as a substituent; R2 represents a hydrogen atom, or a linear or branched alkyl group containing 1 to 6 carbon atoms; or R1 and R2 represent a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms together with the carbon atom to which they are bound, provided that the alkyl group and the bridged cyclic hydrocarbon group may have at least one substituent selected from a group consisting of a linear or branched alkyl group containing 1 to 6 carbon atoms which may be optionally substituted, a hydroxy group, a carboxy group, an acyl group containing 2 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, and a carboxy group esterified with an alcohol containing 1 to 6 carbon atoms.
摘要:
The (meth)acrylate of the present invention is represented by the following formula (1). The (meth)acrylate can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol. A polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition. wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—.
摘要翻译:本发明的(甲基)丙烯酸酯由下式(1)表示。 (甲基)丙烯酸酯可以通过首先通过还原1,3-二烯和马来酸酐之间的Diels-Alder反应获得的加成产物,然后水合内酯以制备醇,然后进行(甲基)丙烯酸酯化来制备内酯 的酒精。 通过(共)聚合包含本发明的(甲基)丙烯酸酯的单体组合物制备的聚合物在透明性,耐干蚀刻性和在有机溶剂中的溶解性方面优异,因此优选用作化学增幅抗蚀剂的树脂 组成。 其中R 1,R 2,R 3和R 4中的每一个代表氢原子,甲基 或乙基; X 1或X 2中的任一个表示(甲基)丙烯酰氧基,另一个表示氢原子; A 1和A 2都代表氢原子,或者A 1和A 2 O 2 - , - O - CH 2 - 或-CH 2 CH 2 - 。
摘要:
A sublimation dispersion dye receptive resin composition which comprises a polyester resin, a cross- linking agent obtained by curing by activating energy, and a releasing agent which can effect the cross-linked construction of at least one selected from the group of silicon functional groups and functional groups containing fluorine. This resin composition is especially applicable to image-receiving paper or image-receiving film for sublimation-type thermal dye transfer methods; it has superior anti-blocking and heat-resistant characteristics. Furthermore, by means of the addition of benzotriazol ultraviolet stabilizer or hindered amine photostabilizer, the fading characteristics are improved.
摘要:
The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
摘要:
A liquid crystal substrate managing apparatus comprises a data management section with a database for recording a defect information acquired from a liquid crystal testing device, and an image information and a repair information acquired from a liquid crystal repair device. The data management section performs the reidentification of a defect and/or the redetermination of a panel and/or a substrate based on the defect information, the image information and the repair information recorded in the database.
摘要:
A resist resin containing a monomer unit selected from the group comprising a monomer unit represented by Formula (II): wherein a substituent R3 represents an alkyl group, or a functional group comprising an acid-deprotectable protecting group, m representing the number of R3 is 0 (non-substitution), 1, 2 or more, R3 may be different from each other, provided that m is 2 or more, and n represents an integer of 0 to 4, has no rough spots on the surface after etching and so has good dry etching resistance, and therefore the resist resin is preferably used as a photo resist for DUV.
摘要:
A photocuring sheet wherein a photocuring resin composition (A) comprising an acrylic resin with a photopolymerizable functional group on the side chains (a-1) and a photopolymerization initiator (a-2), is laminated on a transparent base sheet (B), photocuring decorative sheets and photocuring insert molding sheets employing it, and molded articles and a process for their manufacture, in which the sheets are used.
摘要:
A polyester resin for a dye receptive layer of a recording medium for sublimation type heat-sensitive transfer recording process, and a recording medium using thereof, which has superior resistance to light exposure and dark fade out. A polyester resin for a dye receptive layer of a recording medium for sublimation type heat-sensitive transfer recording process, wherein said polyester resin is formed by using a diol component containing a diol compound shown in Formula (1) in a range of 5-80 molar % with respect to the total diol component, and a receiving medium using thereof. ##STR1## (In Formula (1), each of R.sub.1 and R.sub.2 represents an alkylene group having a number of carbon atoms within a range of 1-12.)
摘要:
A recording medium for sublimation type heat-sensitive transfer recording process is disclosed in which an image receiving layer constituting a resin composition containing a dyeable resin and at least one compound shown in Formula (1) is formed on a substrate surface. This recording medium for sublimation type heat-sensitive transfer recording process has extremely superior light resistance, and the image recorded on this recording medium suffers little fade out or discoloration as a result of exposure to light, so that this recording medium is expected to contribute greatly to the spread of video printers and the like. ##STR1## (In Formula (1), R.sub.1 represents an alkyl group having a number of carbon atoms within a range of 1-20, and A represents a substituted or unsubstituted phenylene group or naphthalene group.)