发明申请
- 专利标题: METHOD OF MEASURING A LITHOGRAPHIC PROJECTION APPARATUS
- 专利标题(中): 测量抛物面投影装置的方法
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申请号: US12423570申请日: 2009-04-14
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公开(公告)号: US20090268182A1公开(公告)日: 2009-10-29
- 发明人: Frank STAALS , Gerardus Carolus Johannus Hofmans , Hans Van Der Laan , Sven Gunnar Krister Magnusson
- 申请人: Frank STAALS , Gerardus Carolus Johannus Hofmans , Hans Van Der Laan , Sven Gunnar Krister Magnusson
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/32
摘要:
A method of measuring a lithographic projection apparatus is described. The method includes imaging a verification mark of a patterning device onto a radiation-sensitive layer held by a substrate table of a lithographic apparatus, wherein the verification mark includes at least a first, a second and a third verification structure that have a mutually different sensitivity profile for a dose setting, a focus setting and a contrast setting.
公开/授权文献
- US08208122B2 Method of measuring a lithographic projection apparatus 公开/授权日:2012-06-26