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    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    3.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20120013879A1

    公开(公告)日：2012-01-19

    申请号：US13178965

    申请日：2011-07-08

    申请人： Arie Jeffrey Den Boef ,  Frank Staals ,  Lukasz Jerzy Macht

    发明人： Arie Jeffrey Den Boef ,  Frank Staals ,  Lukasz Jerzy Macht

    IPC分类号： G03B27/54 ,  G01B11/22

    CPC分类号： G01B11/0608 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7034 ,  G03F9/7088

    摘要： The invention provides a level sensor configured to determine a height level of a surface of a substrate supported on a movable substrate support, the level sensor including multiple projection units, multiple detection units, and a processing unit to calculate a height level for each of a plurality of measurement locations on the basis of the measurement beams from the projection units, wherein the level sensor is configured to measure height levels simultaneously at multiple measurement locations on the substrate, wherein the substrate support is configured to move the substrate in a first direction substantially parallel to the surface of the substrate to measure a height level at different locations on the substrate, and wherein at least part of the multiple measurement locations are at least spaced in a second direction that is substantially parallel to the surface of the substrate and perpendicular to the first direction.

    摘要翻译： 本发明提供了一种水平传感器，其被配置为确定支撑在可移动衬底支撑件上的衬底的表面的高度水平，所述液位传感器包括多个投影单元，多个检测单元和处理单元，以计算每个 基于来自所述投影单元的测量光束的多个测量位置，其中所述液位传感器被配置为在所述基板上的多个测量位置处同时测量高度水平，其中所述基板支撑件被配置成基本上在第一方向上移动所述基板 平行于衬底的表面以测量衬底上不同位置处的高度水平，并且其中多个测量位置的至少一部分在基本上平行于衬底的表面并且垂直于衬底的第二方向上至少间隔开 第一个方向。

    Method and Lithographic Apparatus for Measuring and Acquiring Height Data Relating to a Substrate Surface
    4.
    发明申请
    Method and Lithographic Apparatus for Measuring and Acquiring Height Data Relating to a Substrate Surface 失效
    用于测量和获取与基板表面相关的高度数据的方法和平版印刷设备

    公开(公告)号：US20090231563A1

    公开(公告)日：2009-09-17

    申请号：US12399737

    申请日：2009-03-06

    申请人： Frank Staals ,  Paulus Antonius Andreas Teunissen ,  Ronald Albert John Van Doorn

    发明人： Frank Staals ,  Paulus Antonius Andreas Teunissen ,  Ronald Albert John Van Doorn

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70758 ,  G03F7/70725

    摘要： A lithographic apparatus includes a level sensor for use in positioning a target portion of the substrate with respect to a focal plane of the projection system, a pair of actuators, configured to move a substrate table of the lithographic apparatus, and a controller for moving the substrate relative to the level sensor by controlling the actuators. The controller combines motions of the first and second actuators to produce a combined movement having a speed higher than a maximum speed of at least one of the actuators individually.

    摘要翻译： 平版印刷设备包括用于相对于投影系统的焦平面定位基板的目标部分的液位传感器，配置成移动光刻设备的基板台的一对致动器，以及用于移动 通过控制致动器相对于液位传感器的基板。 控制器组合第一和第二致动器的运动，以产生具有高于致动器中的至少一个致动器的最大速度的组合运动。

    Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface
    6.
    发明授权
    Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface 失效
    用于测量和获取与衬底表面有关的高度数据的方法和光刻设备

    公开(公告)号：US08582082B2

    公开(公告)日：2013-11-12

    申请号：US12399737

    申请日：2009-03-06

    申请人： Frank Staals ,  Paulus Antonius Andreas Teunissen ,  Ronald Albert John Van Doorn

    发明人： Frank Staals ,  Paulus Antonius Andreas Teunissen ,  Ronald Albert John Van Doorn

    IPC分类号： G03B27/52 ,  G03B27/32

    CPC分类号： G03F7/70758 ,  G03F7/70725

    摘要： A lithographic apparatus includes a level sensor for use in positioning a target portion of the substrate with respect to a focal plane of the projection system, a pair of actuators, configured to move a substrate table of the lithographic apparatus, and a controller for moving the substrate relative to the level sensor by controlling the actuators. The controller combines motions of the first and second actuators to produce a combined movement having a speed higher than a maximum speed of at least one of the actuators individually.

    摘要翻译： 平版印刷设备包括用于相对于投影系统的焦平面定位基板的目标部分的液位传感器，配置成移动光刻设备的基板台的一对致动器，以及用于移动 通过控制致动器相对于液位传感器的基板。 控制器组合第一和第二致动器的运动，以产生具有高于致动器中的至少一个致动器的最大速度的组合运动。

    LITHOGRAPHIC APPARATUS WITH ADJUSTED EXPOSURE SLIT SHAPE ENABLING REDUCTION OF FOCUS ERRORS DUE TO SUBSTRATE TOPOLOGY AND DEVICE MANUFACTURING METHOD
    8.
    发明申请
    LITHOGRAPHIC APPARATUS WITH ADJUSTED EXPOSURE SLIT SHAPE ENABLING REDUCTION OF FOCUS ERRORS DUE TO SUBSTRATE TOPOLOGY AND DEVICE MANUFACTURING METHOD 有权
    具有调整的曝光片形状的平版印刷设备使得基底拓扑和器件制造方法能够减少焦点错误

    公开(公告)号：US20090153821A1

    公开(公告)日：2009-06-18

    申请号：US12329076

    申请日：2008-12-05

    申请人： Sven Gunnar Krister Magnusson ,  Martin Jules Marie-Emile De Nivelle ,  Frank Staals ,  Wim Tjibbo Tel

    发明人： Sven Gunnar Krister Magnusson ,  Martin Jules Marie-Emile De Nivelle ,  Frank Staals ,  Wim Tjibbo Tel

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70066

    摘要： A lithographic apparatus includes an illumination system to condition a radiation beam; a patterning device support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, and a projection system to project the patterned radiation beam in a scanning exposure along a scanning direction onto a target portion of the substrate. The illumination system is configured to form in a plane of the patterning device a slit shaped image. The slit shaped image has a curved shape with a slit curvature in the scanning direction, with a length in the scanning direction and a width perpendicular to the scanning direction. The slit shaped image is configured to create a curved pattern image portion of the patterned radiation beam in an image plane of the projection system.

    摘要翻译： 光刻设备包括用于调节辐射束的照明系统; 图案形成装置支撑件以支撑图案形成装置，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底的衬底台，以及投影系统，用于沿着扫描方向将图案化的辐射束沿扫描曝光投影到衬底的目标部分上。 照明系统构造成在图案形成装置的平面中形成狭缝形图像。 狭缝形状的图像具有在扫描方向上具有狭缝曲率的弯曲形状，扫描方向上的长度和垂直于扫描方向的宽度。 狭缝形状的图像被配置为在投影系统的图像平面中产生图案化的辐射束的弯曲图案图像部分。

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    10.
    发明申请
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US20050030507A1

    公开(公告)日：2005-02-10

    申请号：US10892395

    申请日：2004-07-16

    申请人： Paulus Antonius Teunissen ,  Gerrit Nijmeijer ,  Rene Marinus Queens ,  Frank Staals ,  Robert Van Wijk ,  Roeland Nicolaas Vanneer

    发明人： Paulus Antonius Teunissen ,  Gerrit Nijmeijer ,  Rene Marinus Queens ,  Frank Staals ,  Robert Van Wijk ,  Roeland Nicolaas Vanneer

    IPC分类号： G03F9/00 ,  G03B27/52

    CPC分类号： G03F9/7019 ,  G03F9/7034

    摘要： According to one embodiment, a method of calibrating level sensors of at least two lithographic projection apparatus to correct machine to machine level sensor process dependency includes using a first lithographic projection apparatus to measure a first set of leveling data for a reference substrate and a second set of leveling data for a substrate processed according to a selected process, and using a second lithographic projection apparatus to measure a third set of leveling data for the reference substrate and a fourth set of leveling data for the processed substrate. The method also includes calculating, based on the first, second, third and fourth sets of leveling data, a set of level sensor parameters corresponding to machine to machine level sensor differences for the selected process, wherein the machine to machine level sensor differences are measured and stored as intrafield values.

    摘要翻译： 根据一个实施例，一种校准至少两个光刻投影设备的水平传感器以校正机器与机器水平传感器处理依赖性的方法包括使用第一光刻投影设备来测量参考基板和第二组的第一组调平数据 根据所选择的工艺处理的衬底的调平数据，以及使用第二光刻投影装置测量用于所述参考衬底的第三组校平数据和用于所述经处理衬底的第四组校平数据。 该方法还包括基于第一，第二，第三和第四组平整数据计算一组对于所选择的过程的机器与机器水平传感器差异的水平传感器参数，其中测量机器与机器水平传感器差异 并作为场内值存储。