发明申请
US20090269494A1 FILM-FORMING APPARATUS, FILM-FORMING METHOD AND RECORDING MEDIUM
审中-公开
成膜装置,成膜方法和记录介质
- 专利标题: FILM-FORMING APPARATUS, FILM-FORMING METHOD AND RECORDING MEDIUM
- 专利标题(中): 成膜装置,成膜方法和记录介质
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申请号: US11910508申请日: 2006-04-03
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公开(公告)号: US20090269494A1公开(公告)日: 2009-10-29
- 发明人: Tsuyoshi Takahashi , Shintaro Aoyama , Takahiro Shinada , Masato Kawakami
- 申请人: Tsuyoshi Takahashi , Shintaro Aoyama , Takahiro Shinada , Masato Kawakami
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2005-107667 20050404
- 国际申请: PCT/JP2006/307058 WO 20060403
- 主分类号: C23C16/22
- IPC分类号: C23C16/22 ; C23C16/46
摘要:
A film forming apparatus comprises a processing chamber for holding therein a to-be-processed substrate, a first gas supplying means for supplying into the processing chamber a first vapor source including a metal alkoxide having a tertiary butoxyl group as a ligand, and a second gas supplying means for supplying into the processing chamber a second vapor source including a silicon alkoxide source, wherein the first gas supplying means and the second gas supplying means are connected to a pre-reaction means for causing pre-reactions of the first vapor source and the second vapor source, and the film forming apparatus is configured to supply the first vapor source and the second vapor source after the pre-reactions into the processing chamber.