发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND METHOD
- 专利标题（中）： LITHOGRAPHIC设备和方法
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申请号： US12436635申请日： 2009-05-06
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公开(公告)号： US20090279061A1公开(公告)日： 2009-11-12
- 发明人: Johannes Henricus Wilhelmus JACOBS , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
- 申请人： Johannes Henricus Wilhelmus JACOBS , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/32
摘要：
A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
公开/授权文献
- US08564763B2 Lithographic apparatus and method 公开/授权日：2013-10-22
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