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公开(公告)号：US08462314B2
公开(公告)日：2013-06-11
申请号：US12222123
申请日：2008-08-01
申请人： Marcel Beckers , Marcus Adrianus Van De Kerkhof , Siebe Landheer , Wouterus Johannes Petrus Maria Maas , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Franciscus Johannes Joseph Janssen , Bartholomeus Mathias Van Oerle
发明人： Marcel Beckers , Marcus Adrianus Van De Kerkhof , Siebe Landheer , Wouterus Johannes Petrus Maria Maas , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Franciscus Johannes Joseph Janssen , Bartholomeus Mathias Van Oerle
CPC分类号： G03F7/70341 , G03F7/70808 , G03F7/70958
摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.
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2.发明授权公开(公告)号：US07595496B2
公开(公告)日：2009-09-29
申请号：US11812801
申请日：2007-06-21
申请人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
发明人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
IPC分类号： G21K5/00
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。
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公开(公告)号：US08564763B2
公开(公告)日：2013-10-22
申请号：US12436635
申请日：2009-05-06
申请人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
发明人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
摘要翻译： 公开了一种衬底台，其中提供加热器以考虑可施加于衬底的热负荷。 加热器分段分段以改善控制。 可以提供每个段的温度传感器。 温度传感器可以嵌入在基板台中。
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4.发明授权公开(公告)号：US07250237B2
公开(公告)日：2007-07-31
申请号：US10743272
申请日：2003-12-23
申请人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
发明人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations.Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。
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公开(公告)号：US08416395B2
公开(公告)日：2013-04-09
申请号：US12436635
申请日：2009-05-06
申请人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
发明人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
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公开(公告)号：US20090279061A1
公开(公告)日：2009-11-12
申请号：US12436635
申请日：2009-05-06
申请人： Johannes Henricus Wilhelmus JACOBS , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
发明人： Johannes Henricus Wilhelmus JACOBS , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
摘要翻译： 公开了一种衬底台，其中提供加热器以考虑可施加于衬底的热负荷。 加热器分段分段以改善控制。 可以提供每个段的温度传感器。 温度传感器可以嵌入在基板台中。
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