- 专利标题： APC SYSTEM AND MULTIVARIATE MONITORING METHOD FOR PLASMA PROCESS MACHINE
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申请号： US12540001申请日： 2009-08-12
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公开(公告)号： US20090299668A1公开(公告)日： 2009-12-03
- 发明人: Tuung Luoh , Sheng-Hui Hsieh , Shing-Ann Luo , Chin-Ta Su , Ta-Hung Yang , Kuang-Chao Chen
- 申请人： Tuung Luoh , Sheng-Hui Hsieh , Shing-Ann Luo , Chin-Ta Su , Ta-Hung Yang , Kuang-Chao Chen
- 申请人地址： TW Hsinchu
- 专利权人： MACRONIX Industrial Co., Ltd.
- 当前专利权人： MACRONIX Industrial Co., Ltd.
- 当前专利权人地址： TW Hsinchu
- 优先权： TW95144168 20061129
- 主分类号： G06F19/00
- IPC分类号： G06F19/00 ; G06F15/00 ; G01J3/30
摘要：
An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system.