发明申请
- 专利标题： METHOD OF MODIFYING SURFACE AREA AND ELECTRONIC DEVICE
- 专利标题（中）： 修改表面区域和电子设备的方法
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申请号： US11720322申请日： 2005-11-25
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公开(公告)号： US20090302419A1公开(公告)日： 2009-12-10
- 发明人: Antonius L A M Kemmeren , Freddy Roozeboom , Johan H. Klootwijk , Robertus A. M. Wolters
- 申请人： Antonius L A M Kemmeren , Freddy Roozeboom , Johan H. Klootwijk , Robertus A. M. Wolters
- 申请人地址： NL Eindhoven
- 专利权人： KONINKLIJKE PHILIPS ELECTRONICS N.V.
- 当前专利权人： KONINKLIJKE PHILIPS ELECTRONICS N.V.
- 当前专利权人地址： NL Eindhoven
- 优先权： EP04106120.1 20041126; EP05100364.8 20050121
- 国际申请： PCT/IB2005/053905 WO 20051125
- 主分类号： H01L27/06
- IPC分类号： H01L27/06 ; H01L21/02 ; H01L21/302
摘要：
In the method a first layer, particularly of amorphous silicon, is deposited on the surface of a substrate with trenches. Part of this surface is covered with a protective layer. The first layer is thereafter maskless removed with a dry etching treatment on the substrate surface while it is kept within the trench.